Optically oriented three-dimensional polymer microstructures

• US 7,382,959 B1
• Filed: 10/13/2006
• Issued: 06/03/2008
• Est. Priority Date: 10/13/2006
• Status: Active Grant

• Current Assignee: HRL Laboratories LLC (The Boeing Co.)
• Original Assignee: HRL Laboratories LLC (The Boeing Co.)
• Inventors: Jacobsen, Alan J.
• Primary Examiner(s): Sanghavi; Hemang
• Assistant Examiner(s): Prince; Kajli
• Application Number:
  US11/580,335
• Time in Patent Office: 599 Days
• Field of Search: 385129-130
• US Class Current: 385/129
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 1/005 made of photonic crystals or photonic band gap materials photonic band-gap structures or photonic lattices in integrated optics G02B6/1225; photonic band-gap structures or photonic lattices in optical fibres G02B6/02295
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/138 by using polymerisation
• CPC Class Codes: G03F 7/0005 Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
• CPC Class Codes: G03F 7/0037 Production of three-dimensional images
• CPC Class Codes: G03F 7/201 characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
• CPC Class Codes: G03F 7/2012 using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

Abstract

A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at least one collimated light source selected to produce a collimated light beam; a reservoir having a photo-monomer adapted to polymerize by the collimated light beam; and a mask having at least one aperture and positioned between the at least one collimated light source and the reservoir. Here, the at least one aperture is adapted to guide a portion of the collimated light beam into the photo-monomer to form the at least one polymer waveguide through a portion of a volume of the photo-monomer.

Claims

1. A system for forming a plurality of polymer waveguides, the system comprising:

at least one collimated light source adapted to produce a plurality of collimated light beams;

a reservoir having a volume of photo-monomer adapted to polymerize by the collimated light beams; and

a mask disposed between the at least one collimated light source and the reservoir, the mask extending along a single plane and having at least one aperture adapted to guide a first beam, a second beam and a third beam of the collimated light beams into the photo-monomer to respectively form a first waveguide, a second waveguide and a third waveguide of the polymer waveguides in a portion of the volume of the photo-monomer,

wherein the first beam is directed at a first angle with respect to the single plane,

wherein the second beam is directed at a second angle with respect to the single plane, the second angle being different from the first angle,

wherein the third beam is directed at a third angle with respect to the single plane, the third angle being different from the first angle and the second angle,

wherein the first waveguide forms a fourth angle with respect to the single plane, the fourth angle corresponding to the first angle,

wherein the second waveguide forms a fifth angle with respect to the single plane, the fifth angle corresponding to the second angle,

wherein the third waveguide forms a sixth angle with respect to the single plane, the sixth angle corresponding to the third angle, and

wherein the first waveguide, the second waveguide and the third waveguide intersect each other at the at least one aperture.

2. The system of claim 1, wherein at least one of the first angle, the second angle or the third angle is an acute angle.

3. The system of claim 1, wherein at least one of the first beam, the second beam or the third beam is unfocused at the at least one aperture.

4. The system of claim 1, wherein the at least one collimated light source comprises first, second and third light sources adapted to respectively produce the first, second and third beams, and wherein the first beam, the second beam and the third beam are directed at the first angle, the second angle and the third angle, respectively, at the at least one collimated light source.

5. The system of claim 1,

wherein the at least one collimated light source comprises first, second and third light sources adapted to respectively produce the first, second and third beams, and

wherein the first, second and third waveguides are formed from a concurrent exposure of the first, second and third beams through the at least one aperture of the mask.

6. The system of claim 1, wherein the at least one aperture comprises a plurality of apertures adapted to guide the collimated light beams to form the plurality of polymer waveguides.

7. The system of claim 1,

wherein the at least one collimated light source comprises a plurality of collimated light sources,

wherein the at least one aperture comprises a plurality of apertures extending along the single plane and adapted to guide the collimated light beams to form the polymer waveguides from a concurrent exposure of the collimated light beams through the apertures, and

wherein the plurality of polymer waveguides forms an interconnected three-dimensional (3D) ordered polymer microstructure.

8. The system of claim 7, wherein a spacing between the plurality of waveguides in the 3D ordered polymer microstructure corresponds with a pattern of the plurality of apertures.

9. The system of claim 1, wherein the mask is in contact with at least one surface of the volume of the photo-monomer.

10. The system of claim 1, further comprising a substrate substantially transparent to the collimated light beams, wherein the substrate is interposed between the mask and the volume of the photo-monomer.

22. The system of claim 1,

wherein the polymer waveguides form a self-supporting structure.

11. A method for forming a plurality of polymer waveguides, the method comprising:

securing a volume of a photo-monomer;

placing a mask between at least one collimated light source and the volume of the photo-monomer, the mask extending along a single plane and having at least one aperture; and

directing a plurality of collimated light beams, the collimated light beams including first, second and third collimated light beams, from the at least one collimated light source toward the at least one aperture to respectively form first, second and third waveguides of the polymer waveguides in a portion of the volume of the photo-monomer,

wherein the first collimated light beam is directed at a first angle with respect to the single plane,

wherein the second collimated light beam is directed at a second angle with respect to the single plane, the second angle being different from the first angle,

wherein the third collimated light beam is directed at a third angle with respect to the single plane, the third angle being different from the first angle and the second angle,

wherein the first waveguide forms a fourth angle with respect to the single plane, the fourth angle corresponding to the first angle,

wherein the second waveguide forms a fifth angle with respect to the single plane, the fifth angle corresponding to the second angle,

wherein the third waveguide forms a sixth angle with respect to the single plane, the sixth angle corresponding to the third angle, and

wherein the first, second and third waveguides intersect each other at the at least one aperture.

12. The method of claim 11, wherein each of the first, second and third waveguides has a cross sectional geometry substantially matching a shape of the at least one aperture.

13. The method of claim 11,

wherein the first collimated light beam has an incident power,

wherein the first waveguide is formed by an exposure of the first collimated light beam through the at least one aperture, and

wherein a time duration of the exposure is based on the incident power and a desired length of the first waveguide.

14. The method of claim 11,

wherein at least one of the first collimated light beam, the second collimated light beam or the third collimated light beam is unfocused at the at least one aperture.

15. The method of claim 14, wherein the at least one collimated light source comprises first, second and third light sources adapted to respectively produce the first, second and third collimated light beams, and

wherein the first collimated light beam, the second collimated light beam and the third collimated light beam are directed at the first angle, the second angle and the third angle, respectively, at the at least one collimated light source.

16. The method of claim 11,

wherein the at least one collimated light source comprises first, second and third light sources adapted to respectively produce the first, second and third collimated light beams, and

wherein the first, second and third waveguides are formed from a concurrent exposure of the first, second and third collimated light beams through the at least one aperture of the mask.

17. The method of claim 11, wherein the at least one collimated light source comprises a plurality of collimated light sources, and

wherein the at least one aperture comprises a plurality of apertures extending along the single plane and adapted to guide the collimated light beams to form the plurality of polymer waveguides from a concurrent exposure of the collimated light beams through the apertures.

18. The method of claim 17, further comprising:

removing any uncured photo-monomer to leave behind a three-dimensional (3D) ordered polymer microstructure.

19. The method of claim 17, wherein the plurality of polymer waveguides forms an interconnected three-dimensional (3D) ordered polymer microstructure.

20. The method of claim 19, wherein a spacing between the plurality of waveguides in the 3D ordered polymer microstructure corresponds with a pattern of the plurality of apertures.

23. The method of claim 11,

wherein the polymer waveguides form a self-supporting structure.

21. A method for forming a plurality of patterned polymer waveguides, the method comprising:

securing a volume of a photo-monomer; and

directing a plurality of light beams from at least one light source through a plurality of apertures of a mask disposed above the volume of the photo-monomer, the mask extending along a single plane, and to the photo-monomer to concurrently form the plurality of patterned polymer waveguides in a portion of the volume of the photo-monomer,

wherein the patterned polymer waveguides intersect each other at a plurality of concurrently formed intersection regions located within the volume of the photo-monomer.