Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same

• US 7,383,601 B2
• Filed: 04/27/2006
• Issued: 06/10/2008
• Est. Priority Date: 03/31/2004
• Status: Expired due to Fees

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: de Larios, John M., Ravkin, Michael
• Primary Examiner(s): Perrin; Joseph L.
• Application Number:
  US11/413,916
• Publication Number:
  US 20060191560A1
• Time in Patent Office: 775 Days
• Field of Search: 134/94.1, 134/95.1, 134/99.1, 134/172, 134/184, 134/902, 15/77, 15/82, 15 882- 884, 151/02
• US Class Current: 15/77
• CPC Class Codes: B08B 1/32 using rotary cleaning members
• CPC Class Codes: B08B 3/04 Cleaning involving contact with liquid
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry. The front head is defined in close proximity to a front surface of the substrate while the back head is defined in close proximity to the back surface of the substrate. The back head is positioned substantially opposite to the front head. The front head and the back head are applied as a pair to the substrate when the brush is apart from the substrate.

Claims

1. A substrate preparation system, the system comprising:

a brush coupled to a shaft, the shaft arranged to move between a second height (H2) that is closer to a back surface of the substrate when present and a first height (H1) that is further apart from the surface of the substrate when present, the brush positioned in the second height facilitating a brush scrub of a back surface of a substrate;

a front head defined to be positioned in close proximity to a front surface of the substrate, the front head having a plurality of conduits for delivering and removing a fluid so as to define a fluid meniscus between the front head and a front surface of the substrate; and

a back head defined to be positioned in close proximity to the back surface of the substrate, the back head being positioned substantially opposite to the front head, and the back head having a plurality of conduits for delivering and removing a fluid so as to define a fluid meniscus between the back head and the back surface of the substrate,

wherein the front head and the back head are coupled to arms that orient the front head and the back head in a path that is horizontal and substantially parallel to the substrate and the arms orient the front head and the back head in a vertical direction to enable defining the front head and the back head in close proximity to the front surface of the substrate and the back surface of the substrate, respectively,

wherein the first height of shaft that couples to the brush is spaced apart from the path of the back head.

2. A system as recited in claim 1, wherein the front head is configured to scan the front surface of the substrate and the back head is configured to scan the back surface of the substrate substantially synchronously.

3. A system as recited in claim 1, the plurality of conduits of the front head including a first front conduit, a second front conduit, and a third front conduit, wherein the first front conduit, the second front conduit, and the third front conduit are configured to act substantially simultaneously when in operation.

4. A system as recited in claim 3, wherein the first front conduit is configured to deliver a primary front fluid onto the front surface of the substrate, the second front conduit is configured to deliver a secondary front fluid, and the third front conduit is configured to remove the front primary fluid and the secondary front fluid from over the front surface of the substrate.

5. A system as recited in claim 1, the plurality of conduits of the back head including a first back conduit, a second back conduit, and a third back conduit, wherein the first back conduit, the second back conduit, and the third back conduit are configured to act substantially simultaneously when in operation.

6. A system as recited in claim 5, wherein the first back conduit is configured to deliver a primary back fluid onto the back surface of the substrate, the second back conduit is configured to deliver a secondary back fluid, and the third back conduit is configured to remove the primary back fluid and the secondary back fluid from over the back surface of the substrate.

7. A system as recited in claim 1, further comprising:

a front arm secured to the front head for moving the front head into close proximity of the front surface of the substrate; and

a back arm secured to the back head for moving the back head into close proximity of the back surface of the substrate substantially at the same time as the front head.

8. A system as recited in claim 1, wherein each of the first head and second head include head surfaces that have flat surface regions with conduits, and each of the conduits are defined by discrete holes that reside at the head surfaces and extend through the flat surface regions of the head surfaces.

9. A substrate preparation system, the system comprising:

a brush configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry;

a front head defined in close proximity to a front surface of the substrate, the front head configured to prepare the front surface of the substrate using a front meniscus; and

a back head defined in close proximity to the back surface of the substrate, the back head being positioned substantially opposite to the front head, the back head configured to prepare the back surface of the substrate using a back meniscus,

wherein the front head and the back head are applied as a pair to the substrate when the brush is apart from the substrate, and further wherein the front meniscus and the back meniscus are configured to include a chemistry that is compatible with the brush scrubbing chemistry;

wherein each of the first head and second head include head surfaces that have flat surface regions with conduits, and each of the conduits are defined by discrete holes that reside at the head surfaces and extend through the flat surface regions of the head surfaces.

10. A system as recited in claim 9, wherein the front head is configured to scan the front surface of the substrate and the back head is configured to scan the back surface of the substrate substantially synchronously.

11. A system as recited in claim 9, wherein the chemistry included in the front head and the back head being compatible with the brush scrubbing chemistry is configured to prevent chemical contamination of the front surface of the substrate.

12. A system as recited in claim 9, wherein the front meniscus is configured to include a front cleaning chemistry and the back meniscus includes a back cleaning chemistry.

13. A system as recited in claim 12, wherein the brush scrubbing chemistry includes hydrofluoric acid.

14. A system as recited in claim 13, wherein the front cleaning chemistry includes hydrofluoric acid.

15. A system as recited in claim 9, wherein each of the front meniscus and the back meniscus includes isopropyl alcohol (IPA) vapor, nitrogen, organic compounds, hexanol, ethyl glycol, or compounds mixable with water.

16. A substrate preparation system, the system comprising:

a brush coupled to a shaft, the shaft arranged to move between a second height (H2) that is closer to a back surface of the substrate when present and a first height (H1) that is further apart from the surface of the substrate when present, the brush positioned in the second height facilitating a brush scrub of a back surface of a substrate;

a front head having a plurality of conduits for delivering and removing a fluid, the front head defined to be positioned in close proximity to a front surface of the substrate; and

a back head having a plurality of conduits for delivering and removing a fluid, the back head defined to be positioned in close proximity to the back surface of the substrate, the back head being positioned substantially opposite to the front head,

wherein the front head and the back head are coupled to arms that position the front head and the back head along a path that is horizontal and substantially parallel to the front and back surfaces of substrate, and the arms position the front head and the back head along a vertical direction that is perpendicular to the path to position the front head and the back head in close proximity to the front surface of the substrate and the back surface of the substrate, respectively,

wherein the first height of shaft that couples to the brush is spaced apart from the path of the back head.