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Electron beam apparatus and a device manufacturing method using the same apparatus

  • US 7,385,197 B2
  • Filed: 07/07/2005
  • Issued: 06/10/2008
  • Est. Priority Date: 07/08/2004
  • Status: Expired due to Fees
First Claim
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1. An electron beam apparatus comprising:

  • an electron irradiation optics for irradiating a plurality of primary electron beams onto a sample surface;

    a scanning deflector for performing a scanning operation with said plurality of primary electron beams across the sample surface;

    a beam separator for separating secondary electron beams emanating from respective scanned regions on the sample from said primary electron beam;

    a magnifying electron lens for magnifying a distance between any two beams of the plurality of secondary electron beams that have been separated by said beam separator;

    an optical output converter for converting the plurality of magnified secondary electron beams to optical signals;

    a photoelectric conversion device for converting said optical signal to an electric signal;

    an optical magnifying lens for magnifying said optical signal from said optical output converter into an image on said photoelectric conversion device; and

    a multi-aperture plate disposed in front of said photoelectric conversion device and having a plurality of apertures formed therethrough, said aperture having an aperture area that is large in a peripheral region.

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