Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system for supplying a beam of radiation;
a patterning device that patterns the beam;
a projection system for projecting the patterned beam onto a target portion of a substrate, the patterning device and the projection system being arranged to expose the full width of the substrate, such that the substrate is inspected and exposed in a single pass of the substrate relative to the apparatus;
a detector configured to detect functional features formed on the substrate from previous patterns for a plurality of portions of the substrate across a full width of the substrate while the substrate is in a position for the projection system to project the patterned beam onto the substrate, the detector configured to generate information therefrom; and
a controller configured to adjust at least one of a position of a pattern projected onto the substrate relative to the substrate, a magnification of the pattern projected onto the substrate, and a focus image plane in response to the information from the detector.
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Abstract
A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
55 Citations
29 Claims
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1. A lithographic apparatus, comprising:
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an illumination system for supplying a beam of radiation; a patterning device that patterns the beam; a projection system for projecting the patterned beam onto a target portion of a substrate, the patterning device and the projection system being arranged to expose the full width of the substrate, such that the substrate is inspected and exposed in a single pass of the substrate relative to the apparatus; a detector configured to detect functional features formed on the substrate from previous patterns for a plurality of portions of the substrate across a full width of the substrate while the substrate is in a position for the projection system to project the patterned beam onto the substrate, the detector configured to generate information therefrom; and a controller configured to adjust at least one of a position of a pattern projected onto the substrate relative to the substrate, a magnification of the pattern projected onto the substrate, and a focus image plane in response to the information from the detector. - View Dependent Claims (2, 3, 4)
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5. A lithographic apparatus, comprising:
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an illumination system for supplying a beam of radiation; a patterning device that patterns the beam; a projection system for projecting the patterned beam onto a target portion of a substrate; a detector configured to determine an orientation of the substrate in at least two degrees of freedom while the substrate is in a position for the projection system to project the patterned beam onto the substrate, the detector configured to generate information therefrom; and a controller configured to adjust at least one of a position of a pattern projected onto the substrate relative to the substrate, a magnification of the pattern projected onto the substrate, and a focus image plane in response to the information from the detector. - View Dependent Claims (6)
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7. A lithographic apparatus, comprising:
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an illumination system for supplying a beam of radiation; a patterning device that patterns the beam; a projection system for projecting the patterned beam onto a target portion of a substrate; a detector configured to detect functional features formed on the substrate from previous patterns for a portion of the substrate while the substrate is in a position for the projection system to project the patterned beam onto the substrate, the detector configured to generate information therefrom; and a controller configured to adjust at least one of a magnification of a pattern projected onto the substrate, a position of a pattern projected onto the substrate relative to the substrate, and a focus image plane in response to the information from the detector. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A device manufacturing method, comprising:
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(a) patterning a projection beam of radiation; (b) projecting the patterned beam of radiation onto a target portion of a substrate, (c) inspecting expansion or contraction of the substrate, as well as functional features formed on the substrate from previous patterns, alignment marks formed on the substrate, or orientation of the substrate for a full width of the substrate while the patterned beam of radiation is projected onto the substrate; (d) adjusting at least one of a position of a pattern projected onto the substrate relative to the substrate, a magnification of the pattern projected onto the substrate, and a focus image plane in response to information obtained from step (c); and (e) exposing a full width of the substrate, wherein steps (c) and (e) are performed during a single pass of the substrate relative to the apparatus.
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25. A device manufacturing method comprising:
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(a) patterning a beam of radiation; (b) projecting the patterned beam of radiation onto a target portion of a substrate; (c) detecting previously formed functional features on a portion of the substrate while the substrate is in a position for the projection system to project the patterned beam onto the substrate; and (d) adjusting at least one of a position of a pattern projected onto the substrate relative to the substrate, a magnification of the pattern projected onto the substrate, and a focus image plane in response to information obtained from step (c). - View Dependent Claims (26, 27, 28)
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29. A device manufacturing method, comprising:
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(a) patterning a beam of radiation; (b) projecting the patterned beam of radiation onto a target portion of a substrate; (c) inspecting alignment marks formed on the substrate to determine an orientation of the substrate in at least a first degree and a second degree of rotational freedom while the substrate is in a position for the projection system to project the patterned beam onto the substrate; and (d) adjusting at least one of a position of a pattern projected onto the substrate relative to the substrate, focus image plane, and a magnification of a pattern projected onto the substrate in response to step (c).
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Specification