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Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product

  • US 7,386,830 B2
  • Filed: 08/23/2005
  • Issued: 06/10/2008
  • Est. Priority Date: 08/24/2004
  • Status: Expired due to Fees
First Claim
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1. A computer implemented method for designing an illumination light source, comprising:

  • acquiring a control feature configured to control a dimension of a transferred pattern of a mask pattern;

    designating a plurality of illumination elements illuminating the mask pattern;

    designating first illumination lights to each of first polarization states of a light emitted from each of the illumination elements;

    calculating a first optical image of the control feature, the first optical image formed on a first imaging plane by each of the first illumination lights, the first imaging plane being a best focus plane;

    determining optimal polarization states of the first illumination lights from among the first polarization states, based on an optical characteristic of the first optical image;

    calculating a second optical image of the control feature, the second optical image formed on a second imaging plane by each of the first illumination lights, the second imaging plane being a defocus plane; and

    determining an illumination shape and a polarization state distribution of the light, based on optical characteristics of the first and second optical images and the optimal polarization states.

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