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Optical metrology optimization for repetitive structures

  • US 7,388,677 B2
  • Filed: 02/18/2005
  • Issued: 06/17/2008
  • Est. Priority Date: 03/22/2004
  • Status: Expired due to Fees
First Claim
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1. A method of determining the profile parameters of a repeating structure formed on a wafer using an optical metrology model, the optical metrology model having profile parameters associated with a top-view of the structure and profile parameters associated with a cross-sectional view of the structure, the method comprising:

  • a) characterizing a top-view profile of the structure, the profile of the structure having profile parameters;

    b) selecting the profile parameters to represent variations in the top-view profile of the structure;

    c) selecting profile parameters associated with a cross-sectional view profile of the structure;

    d) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model; and

    e) storing the optical metrology model.

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