Optical metrology optimization for repetitive structures

• US 7,388,677 B2
• Filed: 02/18/2005
• Issued: 06/17/2008
• Est. Priority Date: 03/22/2004
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Timbre Technologies Incorporated (Tokyo Electron Limited)
• Inventors: Bischoff, Joerg, Vuong, Vi, Bao, Junwei
• Primary Examiner(s): Toatley, Jr.; Gregory J.
• Assistant Examiner(s): Underwood; Jarreas C
• Application Number:
  US11/061,303
• Publication Number:
  US 20050209816A1
• Time in Patent Office: 1,215 Days
• Field of Search: 356/369, 356600-603, 356/625, 702/76, 702/108, 702/127, 702/167, 702/189
• US Class Current: 356/601
• CPC Class Codes: G01B 11/24 for measuring contours or curvatures
• CPC Class Codes: G01N 21/4788 Diffraction for sizing particles G01N15/0205
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Abstract

The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.

Claims

1. A method of determining the profile parameters of a repeating structure formed on a wafer using an optical metrology model, the optical metrology model having profile parameters associated with a top-view of the structure and profile parameters associated with a cross-sectional view of the structure, the method comprising:

a) characterizing a top-view profile of the structure, the profile of the structure having profile parameters;

b) selecting the profile parameters to represent variations in the top-view profile of the structure;

c) selecting profile parameters associated with a cross-sectional view profile of the structure;

d) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model; and

e) storing the optical metrology model.

2. The method of claim 1 wherein characterizing profiles of structures comprises:

defining a unit cell of the repeating structures, a unit cell having one or more features; and

characterizing the top-view profile of the one or more features of the unit cell.

3. The method of claim 2 wherein characterizing the top-view profile of the one or more features of the unit cell comprises:

fitting one or more basic shapes to the top-view profile of the one or more features of the unit cell;

identifying parameters of the one or more basic shapes; and

determining variability of the identified parameters of the one or more basic shapes.

4. The method of claim 3 wherein the basic shapes comprises ellipses and/or polygons.

5. The method of claim 4 wherein the identified parameters of the one or more basic shapes include ellipse minor axis, ellipse major axis, or length of one or more sides of a polygon.

6. The method of claim 3 wherein determining variability of the identified parameters comprises:

collecting top-view profile samples of the one or more features of the unit cell;

determining ranges of identified parameters of the one or more basic shapes fitted to the top-view profile of the one or more features of the unit cell.

7. The method of claim 6 wherein collecting top-view profile samples comprises:

collecting top-view samples obtained from simulating fabrication of the repeating structures using process simulators, measuring top-view profiles of the one or more features of the unit cell with metrology devices, or accessing empirical shape data for the repeating structures of the semiconductor application, the empirical shape data including top-view profiles of the one or more features of the unit cell.

8. The method of claim 6 wherein selecting the profile parameters to represent variations in the profile of the repeating structures comprises:

selecting one or more identified parameters of the one or more basic shapes fitted to the top-view profile of the one or more features of the unit cell with the largest ranges of values.

9. The method of claim 1 further comprising:

creating a library of simulated diffraction signals and associated profile parameters, the simulated diffraction signals generated by using a numerical analysis technique to solve Maxwell'"'"'s equations.

10. The method of claim 9 wherein the numerical analysis technique is rigorous coupled-wave analysis, modal analysis, integral method, Green'"'"'s functions, Fresnel method or finite element method.

11. The method of claim 1 further comprising:

creating a machine learning system trained to generate a simulated diffraction signal based on input profile parameters; and

creating the set of simulated diffraction signals using as input a set of profile parameters.

12. The method of claim 11 wherein the machine learning system is

back-propagation, radial basis function, support vector, or kernel regression.

13. The method of claim 2 wherein characterizing the top-view profile of the one or more features of the unit cell comprises:

a) fitting one or more mathematical models to the top-view profile shapes of the one or more features of the unit cell;

b) identifying parameters of the one or more mathematical models; and

c) determining the variability of the identified parameters of the one or more mathematical models.

14. The method of claim 13 wherein the mathematical models comprises equations for geometric shapes.

15. The method of claim 14 wherein the geometric shapes comprises ellipses and/or polygons.

16. The method of claim 15 wherein the identified parameters correspond to variables in equations for ellipses and polygons.

17. The method of claim 13 wherein determining variability of the identified parameters comprises:

collecting top-view profile samples of the one or more features of the unit cell; and

determining ranges of identified parameters of the one or more mathematical models fitted to the top-view profile shapes of the one or more features of the unit cell.

18. The method of claim 17 wherein collecting top-view profile samples comprises:

collecting top-view profile samples obtained from simulating fabrication of the repeating structures using process simulators, measuring top-view profiles of the one or more features of the unit cell, or accessing empirical shape data for the repeating structures of the semiconductor application, the empirical shape data including top-view profiles of the one or more features of the unit cell.

19. The method of claim 17 wherein selecting the profile parameters to represent variations in the profile of the repeating structures comprises:

selecting one or more identified parameters of the one or more mathematical models fitted to the top-view profile of the one or more features of the unit cell with the largest ranges of values.

20. A method of modeling repeating structures in a wafer for optical metrology, the method comprising:

a) setting one or more termination criteria;

b) defining a unit cell of the repeating structures in a wafer, the unit cell having one or more features;

c) fitting one or more basic shapes to the top-view profile of the one or more features of the unit cell, the one or more basic shapes having parameters;

d) selecting the parameters of the one or more basic shapes to represent variations in the top-view profile of the structures;

e) selecting profile parameters associated with a cross-sectional view profile of the structure;

f) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model; and

g) storing the optical metrology model.

21. The method of claim 20 further comprising:

h) comparing the calculated one or more termination criteria with the present one or more termination criteria using the generated simulated diffraction signal; and

if the one or more termination criteria are not met, altering the fitting of basic shapes to the top-view profile, altering the selection of parameters in step d) and e) and iterating b), c), d), e), f), and h) until the one or more termination criteria are met.

22. The method of claim 20 wherein:

instead of fitting one or more basic shapes to the top-view profile of the one or more features of the unit cell in step c), fitting one or more mathematical formulas to the top-view profile of the one or more features of the unit cell.

23. A system for optimizing selection of profile parameters of an optical metrology model for use in modeling repeating structures in a wafer, the optical metrology model having profile parameters associated with a top-view of the structure and profile parameters associated with a cross-sectional view of the structure, the system comprising:

a model preprocessor configured to characterize a top-view profile of structure, the profile of the structure having profile parameters;

select the profile parameters to represent variations in the top-view profile of the structures;

select profile parameters associated with a cross-sectional view profile of the structure; and

integrate the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model;

a metrology model optimizer configured to optimize the optical metrology model using one or more criteria and to generate one or more simulated diffraction signals based on the optimized metrology model;

a metrology device configured to measure diffracted signals off the repeating structure;

a comparator configured to determine if one or more termination criteria are met based on calculations using the generated diffraction signals; and

a model adjuster configured to alter characterization of the top-view profile of the structure, selection of profile parameters to represent variations in the top-view profile of the structures; and

selection of profile parameters associated with the cross-sectional view profile of the structure.

24. The system of claim 23 further comprising:

a data store or library or a trained machine language system configured to store physical or logical pairs of profile parameters of repeating structures and corresponding diffraction signals.

25. The system of claim 23 wherein the metrology device is a scatterometric device.

26. The system of claim 25 wherein the scatterometric device is a reflectometer or ellipsometer.

27. A computer-readable storage medium containing computer executable instructions for causing a computer to optimizing selection of profile parameters of an optical metrology model for use in modeling repeating structures in a wafer, the optical metrology model having profile parameters associated with a top-view of the structure and profile parameters associated with a cross-sectional view of the structure, comprising instructions for:

a) characterizing a top-view profile of structure, the profile of the structure having profile parameters;

b) selecting the profile parameters to represent variations in the top-view profile of the structures;

c) selecting profile parameters associated with a cross-sectional view profile of the structure;

d) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model;

e) optimizing the optical metrology model;

f) creating a set of profile parameters and simulated diffraction signals using the optimized optical metrology model;

g) extracting a best match simulated diffraction signal using the set of profile parameters and associated simulated diffraction signals and one or more measured diffraction signals;

h) when the best match simulated diffraction signal and the measured diffraction signals do not match within one or more matching criteria, altering the characterization and/or selection of profile parameters; and

i) iterating a), b), c), d), e), f), g), and h) until the best match simulated diffraction signal and the measured diffraction signal match within the one or more matching criteria.

28. A computer-readable storage medium containing computer executable instructions for causing a computer to optimize an optical metrology model for use in measuring a wafer structure, comprising instructions for:

a) setting one or more termination criteria;

b) defining a unit cell of the repeating structures in a wafer, the unit cell having one or more features;

c) fitting one or more basic shapes to the top-view profile of the one or more features of the unit cell, the one or more basic shapes having parameters;

d) selecting the parameters of the one or more basic shapes to represent variations in the top-view profile of the structures;

e) selecting profile parameters associated with a cross-sectional view profile of the structure;

f) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model;

g) optimizing the optical metrology model using one or more measured diffraction signals off the repeating structure, the optimization generating a simulated diffraction signal;

h) comparing the calculated one or more termination criteria with the preset one or more termination criteria using the generated simulated diffraction signal.

29. A computer-readable storage medium containing computer executable instructions for causing a computer to optimizing selection of profile parameters of an optical metrology model for use in modeling repeating structures in a wafer, the optical metrology model having profile parameters associated with a top-view of the structure and profile parameters associated with a cross-sectional view of the structure, comprising instructions for:

a) characterizing a top-view profile of the structure, the profile of the structure having profile parameters;

b) selecting the profile parameters to represent variations in the top-view profile of the structure;

c) selecting profile parameters associated with a cross-sectional view profile of the structure;

d) integrating the selected profile parameters representing the top-view profile and the cross-sectional view profile of the structure into an optical metrology model; and

e) storing the optical metrology model.