Developing method, substrate treating method, and substrate treating apparatus
First Claim
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1. A substrate treating apparatus comprising:
- a substrate holding mechanism which holds a substrate, the substrate including a plurality of chips;
a solution discharge/suction unit including a solution discharge port for discharging a first solution to one of the chips included in the substrate, and a circle-like suction port for sucking the first solution on the substrate, the suction port being disposed to surround continuously the periphery of the solution discharge port;
a moving mechanism which removes the substrate and the solution discharge/suction unit relatively;
a solution discharge/suction system which simultaneously performs supplying the first solution to the solution discharge/suction unit and sucking the first solution from the solution discharge/suction unit;
a covering rate calculating unit which calculates the covering rate of a pattern included in each of the chips treated by a first solution in a treating region where the first solution flow exists on the substrate; and
a control unit which controls the moving mechanism based on the pattern covering rate calculated by the covering rate calculating unit.
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Abstract
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.
33 Citations
15 Claims
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1. A substrate treating apparatus comprising:
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a substrate holding mechanism which holds a substrate, the substrate including a plurality of chips; a solution discharge/suction unit including a solution discharge port for discharging a first solution to one of the chips included in the substrate, and a circle-like suction port for sucking the first solution on the substrate, the suction port being disposed to surround continuously the periphery of the solution discharge port; a moving mechanism which removes the substrate and the solution discharge/suction unit relatively; a solution discharge/suction system which simultaneously performs supplying the first solution to the solution discharge/suction unit and sucking the first solution from the solution discharge/suction unit; a covering rate calculating unit which calculates the covering rate of a pattern included in each of the chips treated by a first solution in a treating region where the first solution flow exists on the substrate; and a control unit which controls the moving mechanism based on the pattern covering rate calculated by the covering rate calculating unit. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A substrate treating apparatus comprising:
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a substrate holding mechanism which holds a substrate, the substrate including a plurality of chips; a solution discharge/suction unit including a solution discharge port for discharging a first solution to one of the plurality of chips Included in the substrate, and a circle-like suction port for sucking the first solution on the substrate the solution discharge port being disposed to surround continuously the periphery of the suction port; a moving mechanism which removes the substrate and the solution discharge/suction unit relatively; a solution discharge/suction system which simultaneously performs supplying the first solution discharge/suction mechanism and sucking the first solution from the solution discharge/suction mechanism; a covering rate calculating unit which calculates the covering rate of a pattern included in each of the plurality of chips treated by a first solution in a treating region where the first solution flow exists on the substrate; and a control unit which controls the moving mechanism based on the pattern covering rate calculated by the covering rate calculating unit.
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9. A substrate treating apparatus comprising:
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a substrate holding mechanism which holds a substrate, the substrate including a plurality of chips; a solution discharge/suction unit including a solution discharge port for discharging a first solution to one of the chips included in the substrate, and circle-like suction ports for sucking the first solution on the substrate, the suction ports being disposed to surround continuously the periphery of the solution discharge port; a moving mechanism which removes the substrate and the solution discharge/suction unit relatively; an interval adjusting unit which adjusts an interval between the top of the substrate and the solution discharge/suction unit; a solution discharge/suction system which simultaneously performs supplying the first solution to the solution discharge/suction unit and sucking the first solution from the solution discharge/suction unit; a covering rate calculating unit which calculates the covering rate of a pattern included in each of the chips treated by a first solution in a treating region where the first solution flow exists on the substrate; and a control unit which controls at least one of the solution discharge/suction system and the interval adjusting unit. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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Specification