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Wafer support tool for heat treatment and heat treatment apparatus

  • US 7,393,207 B2
  • Filed: 03/22/2004
  • Issued: 07/01/2008
  • Est. Priority Date: 03/26/2003
  • Status: Active Grant
First Claim
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1. A wafer support tool for heat treatment comprising:

  • a support member holder in a form of a flat panel and having a central location point and a flat upper surface, the support member holder extending radially from the central location point, the support member holder having a plurality of slit-shaped pinholes formed into the upper surface, disposed apart from the central location point in a radial direction, angularly spaced apart from one another and extending radially relative to the central location point; and

    a plurality of wafer support members, each one of the plurality of wafer support members having a fitting portion sized to be slidably received in a respective one of the plurality of slit-shaped pinholes and a contact portion integrally connected to the fitting portion and sized to contact and project upwardly from the upper surface of the support member holder when respective ones of the fitting portions are slidably received in respective ones of the plurality of slit-shaped pinholes.

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