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Light patterning device using tilting mirrors in a superpixel form

  • US 7,400,382 B2
  • Filed: 04/28/2005
  • Issued: 07/15/2008
  • Est. Priority Date: 04/28/2005
  • Status: Active Grant
First Claim
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1. A light patterning system, comprising:

  • an illumination system that supplies a beam of radiation having a certain wavelength (λ

    );

    an array of individually controllable elements that patterns said beam, wherein said array includes a superpixel having at least a first tilting mirror that is logically coupled to a second tilting mirror, and wherein said first and second tilting mirrors are (i) substantially adjacent to each other, and (ii) offset in height from each other by a mirror displacement, anda projection system that projects said patterned beam onto a target.

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