Optical microelectromechanical device
First Claim
Patent Images
1. An optical microelectromechanical device, comprising:
- a substrate;
a plurality of conductive lines disposed on the substrate;
a dielectric layer disposed on the conductive lines;
a plurality of reflective members perpendicular to the conductive lines and over the dielectric layer by a predetermined gap, wherein a plurality of overlapping areas of the reflective members and the conductive lines define a plurality of pixel areas; and
a plurality of edge supporters disposed between the dielectric layer and reflective members and adjacent to the edges of each pixel area, wherein the reflective members totally cover at least one edge supporter and the edge supporter and the nearest edge of the reflective member are kept at least a first distance of about 0.3 μ
m to 1.0 μ
m.
3 Assignments
0 Petitions
Accused Products
Abstract
An optical microelectromechanical systems (MEMS) device includes a transparent substrate with a plurality of discrete conductive lines, an dielectric layer disposed on the substrate and the conductive lines, reflective members and edge supporters. The reflective members and conductive lines are orthogonal, defining a plurality of pixel areas. Each reflective member is supported by edge supporters arranged around each pixel area and over the dielectric layer by a predetermined gap. The reflective members cover the connecting end of each edge supporter, providing protection from damage during fabrication.
13 Citations
24 Claims
-
1. An optical microelectromechanical device, comprising:
-
a substrate; a plurality of conductive lines disposed on the substrate; a dielectric layer disposed on the conductive lines; a plurality of reflective members perpendicular to the conductive lines and over the dielectric layer by a predetermined gap, wherein a plurality of overlapping areas of the reflective members and the conductive lines define a plurality of pixel areas; and a plurality of edge supporters disposed between the dielectric layer and reflective members and adjacent to the edges of each pixel area, wherein the reflective members totally cover at least one edge supporter and the edge supporter and the nearest edge of the reflective member are kept at least a first distance of about 0.3 μ
m to 1.0 μ
m. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. An optical microelectromechanical device, comprising:
-
a substrate; a plurality of conductive lines disposed on the substrate; a dielectric layer disposed on the conductive lines; a plurality of reflective members perpendicular to the conductive lines and over the dielectric layer by a predetermined gap, wherein a plurality of overlapping areas of the reflective members and the conductive lines define a plurality of pixel areas; and a plurality of edge supporters disposed between the dielectric layer and reflective members and adjacent to the edges of each pixel areas, wherein at least one end of one of the edge supporters and the nearest edge of the reflective member are kept at least a first distance of about 0.3 μ
m to 1.0 μ
m, and the at least one end of one of the edge supporters and the nearest edge of each conductive line are kept at least a second distance. - View Dependent Claims (12, 13, 14, 15, 16, 17)
-
-
18. An optical microelectromechanical device, comprising:
-
a substrate; a plurality of conductive lines disposed on the substrate; a dielectric layer disposed on the conductive lines; a plurality of reflective members perpendicular to the conductive lines and over the dielectric layer by a predetermined gap, wherein a plurality of overlapping areas of the reflective members and the conductive lines define a plurality of pixel areas; and a plurality of edge supporters disposed between the dielectric layer and reflective members, and adjacent to the edges of each pixel areas, wherein at least one end of one of the edge supporters and the nearest edge of the reflective member are kept at least a first distance, and the at least one end of one of the edge supporters and the nearest edge of the conductive lines are kept at least a second distance of about 0.3 μ
m to 1.0 μ
m. - View Dependent Claims (19, 20, 21, 22, 23, 24)
-
Specification
-
- Resources
Litigation Campaign Assessment
Thank you for your request. You will receive a custom alert email when the Litigation Campaign Assessment is available.
×
-
Current AssigneeAU Optronics Corporation, Snaptrack Incorporated (Qualcomm, Inc.)
-
Original AssigneeAU Optronics Corporation
-
InventorsWong, Jia-Fam, Lin, Han-Tu, Lee, Chia-Sheng
-
Primary Examiner(s)Sugarman; Scott J.
-
Assistant Examiner(s)PINKNEY, DAWAYNE
-
Application NumberUS11/133,101Publication NumberTime in Patent Office1,160 DaysField of Search359/290, 359/291, 359/223, 359/224, 359/295US Class Current359/291CPC Class CodesG02B 26/001 based on interference in an...
