Method and apparatus for positioning a substrate on a substrate table
First Claim
1. A method for positioning a substrate relative to a substrate holder, comprising:
- determining a first relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a first time;
determining a second relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder a second time; and
adjusting the position of the substrate holder with respect to the substrate based on the first and second relative positions, such that the second time the substrate is positioned relative to the substrate holder, the relative position is substantially the same as the first relative position.
1 Assignment
0 Petitions
Accused Products
Abstract
The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.
12 Citations
17 Claims
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1. A method for positioning a substrate relative to a substrate holder, comprising:
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determining a first relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a first time; determining a second relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder a second time; and adjusting the position of the substrate holder with respect to the substrate based on the first and second relative positions, such that the second time the substrate is positioned relative to the substrate holder, the relative position is substantially the same as the first relative position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material; positioning the substrate relative to a substrate holder, wherein the positioning comprises; determining a first relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a first time; determining a second relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a second time; and adjusting the position of the substrate holder with respect to the substrate based on the first and second relative positions, such that the second time the substrate is positioned relative to the substrate holder, the relative position is substantially the same as the first relative position; conditioning a beam of radiation using a radiation system; providing a support configured to support a patterning device; configuring the beam of radiation with a desired pattern in its cross-section based on the patterning device; and projecting the patterned beam of radiation onto a target area of the layer of radiation-sensitive material.
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10. An apparatus for positioning a substrate, comprising
a substrate holder configured to hold the substrate; -
a carrier including a displacement device that is configured to displace the substrate to and from the substrate holder; a positioning device that is configured to displace the substrate holder relative to the carrier; and an alignment system configured to determine a first relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a first time and to determine a second relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder a second subsequent time, wherein the positioning device is configured to adjust the position of the substrate holder with respect to the substrate based on the first and second relative positions, such that the second time the substrate is positioned relative to the substrate holder it is substantially the same as the first relative position. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. A lithographic apparatus, comprising:
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a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation; a substrate holder configured to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate; and a substrate positioning apparatus, comprising; a carrier including a displacement device that is configured to displace the substrate to and from the substrate holder; a positioning device that is configured to displace the substrate holder relative to the carrier; and an alignment system configured to determine a first relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder for a first time and to determine a second relative position of the substrate with respect to the substrate holder when the substrate is positioned relative to the substrate holder a second subsequent time, wherein the positioning device is configured to adjust the position of the substrate holder with respect to the substrate based on the first and second relative positions, such that the second time the substrate is positioned relative to the substrate holder it is substantially the same as the first relative position.
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Specification