Patterning of mechanical layer in MEMS to reduce stresses at supports
First Claim
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1. A MEMS device, comprising:
- an electrode layer located over a substrate;
at least one support structure; and
a mechanical layer located over said support structure and spaced apart from the electrode layer by a cavity, the mechanical layer comprising an aperture extending through said mechanical layer and overlying a central portion of the support structure, the aperture being surrounded by an annular section of the mechanical layer which extends about the periphery of the support structure and overlies the support structure.
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Abstract
A method of fabricating a MEMS device includes the formation of support posts having horizontal wing portions at the edges of the post. A mechanical layer is deposited over the support posts and portions of the mechanical layer overlying portions of the support post other than the horizontal wing portions are etched away. A resultant MEMS device includes a mechanical layer overlying at least a portion of the horizontal wing portions of the underlying support structures.
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Citations
22 Claims
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1. A MEMS device, comprising:
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an electrode layer located over a substrate; at least one support structure; and a mechanical layer located over said support structure and spaced apart from the electrode layer by a cavity, the mechanical layer comprising an aperture extending through said mechanical layer and overlying a central portion of the support structure, the aperture being surrounded by an annular section of the mechanical layer which extends about the periphery of the support structure and overlies the support structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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- 8. The MEMS device of 2, additionally comprising a partially reflective layer located over the substrate.
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21. An MEMS device, comprising:
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an electrode layer located over a substrate; at least one support structure; a mechanical layer located over said support structure and spaced apart from the electrode layer by a cavity, the mechanical layer comprising an aperture overlying at least a portion of the support structure, wherein an annular section of the mechanical layer that is defined by the aperture extends about the periphery of the support structure and overlies the support structure; and a reflective layer located under the mechanical layer, wherein the reflective layer extends underneath a portion of the support structures.
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22. An MEMS device, comprising:
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an electrode layer located over a substrate; at least one support structure, wherein the support structure comprises a substantially horizontal wing portion extending wound the periphery of the support structure, a sloped sidewall portion located in the interior of the support structure and a transition between said sloped sidewall portion and the horizontal wing portion, and a substantially flat base portion; and a mechanical layer located over said support structure and spaced apart from the electrode layer by a cavity, the mechanical layer comprising an aperture overlying at least a portion of the support structure, wherein an annular section of the mechanical layer that is defined by the aperture extends about the periphery of the support structure and overlies the support structure, and wherein the aperture in the mechanical layer exposes the transition between the sloped sidewall portion and the substantially flat base portion.
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Specification