Liquid crystal display device and method for fabricating the same
First Claim
1. A liquid crystal display device, comprising:
- a gate line on a substrate;
a data line crossing the gate line with a gate insulating film in between to define a pixel area;
a thin film transistor connected to the gate line and the data line;
a semiconductor pattern overlapping along the data line;
a double layer passivation film covering the data line and the thin film transistor, wherein layers of the passivation film have different etching rates; and
a pixel electrode formed in a pixel hole penetrating an upper passivation film of the double layer passivation film and connected to a drain electrode of the thin film transistor exposed through a drain contact hole, the pixel electrode forming a border with the upper passivation film surrounding the pixel hole.
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Abstract
A liquid crystal display device according to the present invention includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film to define a pixel area; a thin film transistor connected to the gate line and the data line; a semiconductor pattern overlapped along the data line; a double layer passivation film covering the data line and the thin film transistor, wherein layers of the passivation film have different etching rates; and a pixel electrode formed in a pixel hole penetrating an upper passivation film of the double layer passivation film and connected to a drain electrode of the thin film transistor exposed through a drain contact hole, the pixel electrode forming a border with the upper passivation film surrounding the pixel hole.
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Citations
84 Claims
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1. A liquid crystal display device, comprising:
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a gate line on a substrate; a data line crossing the gate line with a gate insulating film in between to define a pixel area; a thin film transistor connected to the gate line and the data line; a semiconductor pattern overlapping along the data line; a double layer passivation film covering the data line and the thin film transistor, wherein layers of the passivation film have different etching rates; and a pixel electrode formed in a pixel hole penetrating an upper passivation film of the double layer passivation film and connected to a drain electrode of the thin film transistor exposed through a drain contact hole, the pixel electrode forming a border with the upper passivation film surrounding the pixel hole. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
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41. A method of fabricating a liquid crystal display device, comprising:
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a first mask process of forming a gate line on a substrate and a gate electrode connected to the gate line; a second mask process of forming a gate insulating film covering the gate line and the gate electrode, a semiconductor pattern on the gate insulating film, a data line crossing the gate line on the semiconductor pattern to define a pixel area, a source electrode connected to the data line, and a drain electrode facing the source electrode; a third mask process of forming a double layer passivation film which covers the data line, the source electrode and the drain electrode, a pixel hole penetrating an upper passivation film of the double layer passivation film in the pixel area, a drain contact hole exposing the drain electrode, and a pixel electrode formed in the pixel hole connected to the exposed drain electrode, the pixel electrode forming a border with a side surface of the upper passivation film surrounding the pixel hole. - View Dependent Claims (42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81)
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82. A method of fabricating a liquid crystal display device, comprising:
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forming a gate line and a data line crossing each other with a gate insulating film in between on a substrate to define a pixel area, and a thin film transistor connected to the gate line and the data line; forming a double layer passivation film having a double structure on the substrate, wherein layers of the passivation film have different etching rates; forming a photo-resist pattern on the double layer passivation film; forming a pixel hole penetrating an upper passivation film of the double layer passivation film and a contact hole penetrating the double layer passivation film by wet-etching using the photo-resist pattern as a mask; forming a transparent conductive film on the photo-resist pattern, and a pixel electrode in the pixel hole to form a border with the upper passivation film, the pixel electrode being connected to the thin film transistor through the contact hole; and lifting-off the photo-resist pattern over the transparent conductive film. - View Dependent Claims (83)
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84. A method of fabricating a liquid crystal display device, comprising:
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forming a first conductive layer on a substrate; forming a lower insulating film covering the first conductive layer; forming an upper insulating film having a higher etching rate than the lower insulating film; forming a photo-resist pattern on the upper insulating film; forming a first hole penetrating the upper and lower insulating films; forming a second hole to expose the lower insulating film by wet-etching the upper insulating film, and forming a side surface of the upper insulating film that is over-etched versus the photo-resist pattern; forming a second conductive layer covering the photo-resist pattern, and a second conductive pattern, which is separated from the second conductive layer and connected to the first conductive layer through the first hole, in the second hole to form a border with the upper insulating film; and lifting off the photo-resist pattern over the second conductive layer.
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Specification