Display device and method of fabricating the same
First Claim
1. A display device comprising a pixel portion having a plurality of pixels,wherein each of the pixels is provided with a pixel electrode, andwherein the pixel electrode is connected to a semiconductor element over a substrate,wherein the semiconductor element comprises:
- an activation layer,a gate insulating film in contact with the activation layer,a gate electrode opposed to the activation layer through the gate insulating film,a first insulating nitride film provided over the activation layer,an organic resin film provided over the first insulating nitride film,a second insulating nitride film provided over the organic resin film, anda wiring provided over the second insulating nitride film;
wherein an inner wall face of a first opening portion formed in the organic resin film is covered by the second insulating nitride film;
wherein a second opening portion is formed in a laminated layer body including the gate insulating film, the first insulating nitride film and the second insulating nitride film inside the first opening portion;
wherein the activation layer and the wiring are connected through the first opening portion and the second opening portion;
wherein the pixel electrode is connected to the semiconductor element through the wiring electrically;
wherein a first part of an insulating film is formed over the pixel electrode; and
wherein the activation layer is formed over a second part of the insulating film.
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Accused Products
Abstract
To achieve promotion of stability of operational function of display device and enlargement of design margin in circuit design, in a display device including a pixel portion having a semiconductor element and a plurality of pixels provided with pixel electrodes connected to the semiconductor element on a substrate, the semiconductor element includes a photosensitive organic resin film as an interlayer insulating film, an inner wall face of a first opening portion provided at the photosensitive organic resin film is covered by a second insulating nitride film, a second opening portion provided at an inorganic insulating film is provided on an inner side of the first opening portion, the semiconductor and a wiring are connected through the first opening portion and the second opening portion and the pixel electrode is provided at a layer on a lower side of an activation layer.
131 Citations
28 Claims
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1. A display device comprising a pixel portion having a plurality of pixels,
wherein each of the pixels is provided with a pixel electrode, and wherein the pixel electrode is connected to a semiconductor element over a substrate, wherein the semiconductor element comprises: -
an activation layer, a gate insulating film in contact with the activation layer, a gate electrode opposed to the activation layer through the gate insulating film, a first insulating nitride film provided over the activation layer, an organic resin film provided over the first insulating nitride film, a second insulating nitride film provided over the organic resin film, and a wiring provided over the second insulating nitride film; wherein an inner wall face of a first opening portion formed in the organic resin film is covered by the second insulating nitride film; wherein a second opening portion is formed in a laminated layer body including the gate insulating film, the first insulating nitride film and the second insulating nitride film inside the first opening portion; wherein the activation layer and the wiring are connected through the first opening portion and the second opening portion; wherein the pixel electrode is connected to the semiconductor element through the wiring electrically; wherein a first part of an insulating film is formed over the pixel electrode; and wherein the activation layer is formed over a second part of the insulating film. - View Dependent Claims (5, 9, 13, 17, 21, 25)
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2. A display device comprising a pixel portion having a plurality of pixels,
wherein each of the pixels is provided with a pixel electrode, wherein the pixel electrode is connected to a semiconductor element over a substrate, wherein the semiconductor element comprises: -
an activation layer, a gate insulating film in contact with the activation layer, a gate electrode opposed to the activation layer through the gate insulating film, a first insulating nitride film provided over the activation layer, an organic resin film provided over the first insulating nitride film, a second insulating nitride film provided over the organic resin film, and a wiring provided over the second insulating nitride film; wherein an inner wall face of a first opening portion formed in the organic resin film is covered by the second insulating nitride film, a bottom face of said first opening portion including a region in which the first insulating nitride film and the second insulating nitride film are brought into contact with each other over 0.3 through 3 μ
m;wherein a second opening portion is formed in a laminated layer body including the gate insulating film, the first insulating nitride film and the second insulating nitride film inside the first opening portion; wherein the activation layer in the wiring are connected through the first opening portion and the second opening portion; wherein the pixel electrode is connected to the semiconductor element through the wiring electrically; wherein a first part of an insulating film is formed over the pixel electrode; and wherein the activation layer is formed over a second part of the insulating film. - View Dependent Claims (6, 10, 14, 18, 22, 26)
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3. A display device comprising a pixel portion having a plurality of pixels,
wherein each of the pixels is provided with a pixel electrode, wherein the pixel electrode is connected to a semiconductor element over a substrate, wherein the semiconductor element comprises: -
an activation layer, a gate insulating film in contact with the activation layer, a gate electrode opposed to the activation layer through the gate insulating film, a first insulating nitride film provided over the activation layer, an acrylic film provided over the first insulating nitride film, a second insulating nitride film provided over the acrylic film, and a wiring provided over the second insulating nitride film; wherein an inner wall face of a first opening portion formed in the acrylic film is covered by the second insulating nitride film; wherein a second opening portion is formed in a laminated layer body including the gate insulating film, the first insulating nitride film and the second insulating nitride film inside the first opening portion; wherein the activation layer and the wiring are connected through the first opening portion and the second opening portion; wherein the pixel electrode is connected to the semiconductor element through the wiring electrically; wherein a first part of an insulating film is formed over the pixel electrode; and wherein the activation layer is formed over a second part of the insulating film. - View Dependent Claims (7, 11, 15, 19, 23, 27)
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4. A display device comprising a pixel portion having a plurality of pixels,
wherein each of the pixels is provided with a pixel electrode, wherein the pixel electrode is connected to a semiconductor element over a substrate, wherein the semiconductor element comprises: -
an activation layer, a gate insulating film in contact with the activation layer, a gate electrode opposed to the activation layer through the gate insulating film, a first insulating nitride film provided over the activation layer, an acrylic film provided over the first insulating nitride film, a second insulating nitride film provided over the acrylic film, and a wiring provided over the second insulating nitride film; wherein an inner wall face of a first opening portion formed in the acrylic film is covered by the second insulating nitride film, a bottom face of said first opening portion including a region in which the first insulating film and the second insulating film are brought into contact with each other over 0.3 through 3 μ
m;wherein a second opening portion is formed in a laminated layer body including the gate insulating film, the first insulating nitride film and the second insulating nitride film inside the first opening portion; wherein the activation layer and the wiring are connected through the first opening portion and the second opening portion; wherein the pixel electrode is connected to the semiconductor element through the wiring electrically; wherein a first part of an insulating film is formed over the pixel electrode; and wherein the activation layer is formed over a second part of the insulating film. - View Dependent Claims (8, 12, 16, 20, 24, 28)
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Specification