Dual plasma beam sources and method
First Claim
1. Apparatus for generating a plasma, comprising in combination:
- a) a first and a second plasma source, each including a discharge cavity having a first width;
a nozzle extending outwardly from said discharge cavity, said nozzle having a second width which is less than the first width;
at least one electrode within said discharge cavity; and
a plurality of magnets disposed adjacent said cavity for creating a magnetic field null region within said discharge cavity; and
b) an AC power source connected across the at least one electrode in each discharge cavity for energizing the electrodes alternatively as a cathode and an anode, each of said electrodes serving as a cathode electrode being capable of supporting at least one magnetron discharge region within the respective discharge cavity.
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Accused Products
Abstract
A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.
447 Citations
30 Claims
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1. Apparatus for generating a plasma, comprising in combination:
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a) a first and a second plasma source, each including a discharge cavity having a first width;
a nozzle extending outwardly from said discharge cavity, said nozzle having a second width which is less than the first width;
at least one electrode within said discharge cavity; and
a plurality of magnets disposed adjacent said cavity for creating a magnetic field null region within said discharge cavity; andb) an AC power source connected across the at least one electrode in each discharge cavity for energizing the electrodes alternatively as a cathode and an anode, each of said electrodes serving as a cathode electrode being capable of supporting at least one magnetron discharge region within the respective discharge cavity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of plasma treating a substrate comprising the steps of:
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a) providing a first and a second plasma source, each including a discharge cavity and an outlet for discharging a linear ion beam onto the substrate; b) providing an AC power source across an electrode disposed in each discharge cavity and energizing the electrodes in the first and second plasma sources alternatively as a cathode and an anode, each electrode when serving as a cathode electrode being capable of supporting at least one magnetron discharge region within the discharge cavity; c) establishing mirror magnetic fields out of the first and second plasma sources; d) impeding a flow of electrons by the mirror magnetic field in the first plasma source when the electrode in the discharge cavity of the second plasma source serves as a cathode during a half cycle of the AC power source and impeding the flow of electrons by the mirror magnetic field in the second plasma source when the electrode in the discharge cavity of the first plasma source serves as a cathode during a half cycle of the AC power source; e) introducing an ionizable gas into the discharge cavity of each of the first and second plasma sources; f) ionizing at least some of the atoms of the ionizable gas encountering the impeded electrons; and g) alternatively discharging ions from each nozzle in the form of an ion beam onto a substrate. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A method of generating a plasma, comprising the steps of:
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a) providing a first and a second plasma source, each including a discharge cavity having an outlet for discharging a linear ion beam onto a substrate; b) providing an AC power source across an electrode disposed in each discharge cavity and energizing the electrodes in the first and second plasma sources alternatively as a cathode and an anode, each electrode when serving as a cathode electrode being capable of supporting at least one magnetron discharge region within the discharge cavity; c) establishing a mirror magnetic field out of the outlet of the first plasma source and out of the outlet of the second plasma source; d) impeding a flow of electrons by the mirror magnetic field in the first plasma source when the electrode in the discharge cavity of the second plasma source serves as a cathode during a half cycle of the AC power source and impeding the flow of electrons by the mirror magnetic field in the second plasma source when the electrode in the discharge cavity of the first plasma source serves as a cathode during a half cycle of the AC power source; e) introducing an ionizable gas into the discharge cavity of each of the first and second plasma sources; f) ionizing at least some of the atoms of the ionizable gas encountering the impeded electrons; and g) alternatively discharging the ions from each outlet in the form of an ion beam. - View Dependent Claims (27, 28, 29, 30)
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Specification