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Electrically isolated pillars in active devices

  • US 7,413,945 B2
  • Filed: 10/07/2003
  • Issued: 08/19/2008
  • Est. Priority Date: 06/27/2002
  • Status: Expired due to Fees
First Claim
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1. A method of forming an active device, the method comprising:

  • performing a first patterning operation having a first pattern on a first plurality of layers comprising etching the first plurality of layers into a first plurality of strips oriented in a first direction, the first patterning operation defining a first feature of the active device; and

    performing a second patterning operation having a second pattern comprising etching at least one strip of the first plurality of strips in a second direction, the second direction being different than the first direction to create a pillar on at least one patterned layer of the first plurality of layers, the second patterning operation defining a second feature of the active device, wherein the first and second patterning operations are performed substantially back-to-back.

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