Method and system for calibrating a rotary encoder and making a high resolution rotary encoder
First Claim
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1. A calibration system for a rotary encoder, comprising:
- a rotary encoder disposed on a manufacturing substrate, the rotary encoder including an encoder pattern having a plurality of lines spaced apart by a substantially fixed spacing distance and a detection system to detect position information corresponding to a position of the encoder pattern; and
a calibration pattern written onto a surface of the substrate, the calibration pattern comprising a ring that includes a grating pattern, wherein a radial position of the grating pattern corresponds to an error value of the position of the encoder pattern.
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Abstract
A calibration system for a rotary encoder comprises a rotary encoder disposed on a manufacturing substrate, the rotary encoder including an encoder pattern. The calibration system also includes a calibration pattern written onto a surface of the substrate, the calibration pattern comprising a ring that includes a grating pattern, where a radial position of the grating pattern corresponds to an error value of the position of the encoder pattern. A method of calibrating the errors of a rotary encoder and a method of fabricating a high resolution rotary encoder on a surface of a manufacturing substrate are also provided.
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Citations
17 Claims
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1. A calibration system for a rotary encoder, comprising:
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a rotary encoder disposed on a manufacturing substrate, the rotary encoder including an encoder pattern having a plurality of lines spaced apart by a substantially fixed spacing distance and a detection system to detect position information corresponding to a position of the encoder pattern; and a calibration pattern written onto a surface of the substrate, the calibration pattern comprising a ring that includes a grating pattern, wherein a radial position of the grating pattern corresponds to an error value of the position of the encoder pattern. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of calibrating the errors of a rotary encoder for a manufacturing substrate, comprising:
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providing a rotary encoder disposed on a manufacturing substrate; acquiring positional information from the rotary encoder; providing an interference lithography writing system to write a calibration pattern on at least one surface of the substrate, wherein the writing system includes a controller to receive the positional information from the rotary encoder and to control the writing of the calibration pattern based on the positional information; and writing the calibration pattern on the at least one surface of the substrate. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14)
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15. A method of fabricating a high resolution rotary encoder on a surface of a manufacturing substrate, comprising:
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disposing a rotary encoder on the manufacturing substrate about a rotation axis, the rotary encoder including a first encoder pattern and a detection system to detect position information corresponding to a position of the first encoder pattern; acquiring the positional information from the rotary encoder; providing an interference lithography writing system to write a calibration pattern on a first portion of at least one surface of the substrate, wherein the writing system includes a controller to receive the positional information from the rotary encoder and to control the writing of the calibration pattern based on the positional information; writing the calibration pattern on the at least one surface of the substrate; providing an error detection system having a probe source and a detector to probe and detect error information based on diffraction patterns generated by the calibration pattern when scanned with the probe beam, the error information indicating errors in the positional information of the rotary encoder, wherein the error information is provided to the controller; and writing a second encoder pattern on a second portion of the substrate, wherein the interference lithography writing system writes the second encoder pattern based on the positional information and the error information. - View Dependent Claims (16, 17)
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Specification