Method and systems for total focus deviation adjustments on maskless lithography systems
First Claim
1. A method of correcting an aberration in a maskless lithography system, comprising:
- illuminating a spatial light modulator (SLM) array having a plurality of SLMs, wherein said SLM array defines a first plane;
adjusting a position of at least one SLM in said SLM array from the first plane to a second orientation; and
exposing an object with light from the SLM array.
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Accused Products
Abstract
A method and system for correcting optical aberrations in a maskless lithography system. Adjusters move individual spatial light modulators (SLMs) in an SLM array so that the surface of the SLM array deviates from a flat plane. The deviation compensates for aberrations in the lithography system, such as total focus deviation. In an embodiment, an individual SLM can be tilted, bent, and/or have its elevation changed. Multiple SLMs in the SLM array can move in different ways depending on the compensation to be made. The adjusters can be either actively or passively controlled. The method may be performed only during initial setup of the maskless lithography system, periodically as needed for maintenance of the lithography system, or prior to each exposure in the lithography system.
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Citations
28 Claims
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1. A method of correcting an aberration in a maskless lithography system, comprising:
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illuminating a spatial light modulator (SLM) array having a plurality of SLMs, wherein said SLM array defines a first plane; adjusting a position of at least one SLM in said SLM array from the first plane to a second orientation; and exposing an object with light from the SLM array. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of correcting focal deviation in a maskless lithography system, comprising:
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illuminating a spatial light modulator (SLM) array having a plurality of SLMs, wherein each SLM in the SLM array has a first position; adjusting at least one SLM from said first position to a second position; transmitting light from the SLM array through an optical system; and exposing an object with the transmitted light, wherein said first position is coplanar with the plurality of SLMs in the SLM array, and said second position is not coplanar with the SLM array. - View Dependent Claims (15, 16, 17)
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18. A method of correcting an aberration in a maskless lithography system having a plurality of SLMs in an SLM array, said SLM array having a reflective surface, said method comprising:
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adjusting a position of at least one of said plurality of SLMs based on said aberration; illuminating said SLM array; transmitting light reflected by said SLM array through an optical system; and exposing an object with said light, wherein said adjusting step causes the reflective surface of said SLM array to deviate from a flat plane. - View Dependent Claims (19)
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20. A maskless lithography system, comprising along a light path:
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an illumination source configured to produce light; a spatial light modulator (SLM) array having a plurality of SLMs, each SLM in the plurality of SLMs being attached to a respective adjuster; an optics system configured to condition the light; and an image plane configured to receive the light, wherein each adjuster moves a respective SLM as needed to correct for an optical aberration in the light received by the object, such that a surface of the SLM array deviates from a flat plane. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28)
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Specification