Gas supply member and plasma processing apparatus

• US 7,416,635 B2
• Filed: 03/02/2006
• Issued: 08/26/2008
• Est. Priority Date: 03/02/2005
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Moriya, Tsuyoshi, Murakami, Takahiro
• Primary Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US11/365,509
• Publication Number:
  US 20060196604A1
• Time in Patent Office: 908 Days
• Field of Search: 118/715, 156/345.33, 156/345.34
• US Class Current: 156/345.34
• CPC Class Codes: C23F 4/00 Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

A gas supply member is disposed in a chamber of a plasma processing apparatus and has a planar surface facing an inner space of the chamber and a plurality of gas holes bored in the planar surface to supply a gas through the gas holes to the inner space. An outer periphery portion of each gas hole at the planar surface has a slant surface formed to correspond to a flow of the gas injected through each gas hole. Further, the slant surface includes at least any one of a flat surface and a curved surface. An angle formed between the slant surface and the planar surface is equal to or greater than that formed between the planar surface and a distribution of the gas injected through each gas hole.

Claims

1. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:

a bottom surface facing an inner space of the chamber; and

a plurality of gas holes formed in the bottom surface to supply a gas through the gas holes to the inner space,

wherein an opening portion of each gas hole has a slant surface and all of the bottom surface between neighboring gas holes is formed of only slant surfaces of opening portions of the gas holes, and

wherein the slant surface includes at least any one of a flat surface and a curved surface.

2. The gas supply member of claim 1, wherein the slant surface includes a coned surface, a spherical surface, a parabolic surface, or a combination thereof.

3. The gas supply member of claim 1, wherein an angle between the slant surface and an imaginary plane perpendicular to a central axis of each gas hole is equal to or greater than that between the imaginary plane perpendicular to the central axis of each gas hole and a distribution of the gas injected through each gas hole.

4. The gas supply member of claim 1, wherein an angle between the slant surface and an imaginary plane perpendicular to a central axis of each gas hole is 20°

or greater.

5. The gas supply member of claim 1, wherein the slant surface has an n-fold rotation symmetry about a central axis of each gas hole, n being a natural number greater than 1.

6. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:

a bottom surface facing an inner space of the chamber;

a plurality of grooves concentrically formed in the bottom surface; and

a plurality of gas holes formed in the grooves to supply a gas through the gas holes to the inner space,

wherein all of the bottom surface between neighboring gas holes is formed of only slant surfaces of the grooves, and

wherein each of the slant surfaces includes at least any one of a flat surface and a curved surface.

7. The gas supply member of claim 6, wherein each of the slant surfaces includes a cone surface, a spherical surface, a parabolic surface, or a combination thereof.

8. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:

a bottom surface facing an inner space of the chamber; and

gas channels, opened at the bottom surface, for supplying a gas into the inner space,

wherein an opening portion of each gas channel has a slant surface and all of the bottom surface between neighboring gas channels is formed of only slant surfaces of opening portions of the gas channels, and

wherein the slant surface includes at least any one of a flat surface and a curved surface.

9. The gas supply member of claim 8, wherein the slant surface includes a cone surface, a spherical surface, a parabolic surface, or a combination thereof.

10. The gas supply member of claim 8, wherein each gas channel is of a slit shape.

11. A plasma processing apparatus, which includes a chamber for accommodating therein an object to be processed;

and a gas supply member, disposed in the chamber, for supplying a gas into an inner space of the chamber,

wherein the gas supply member has a bottom surface facing the inner space, and a plurality of gas holes formed in the bottom surface to supply a gas through the gas holes into the inner space,

wherein an opening portion of each gas hole has a slant surface and all of the bottom surface between neighboring gas holes is formed of only slant surfaces of opening portions of the gas holes, and

wherein the slant surface includes at least any one of a flat surface and a curved surface.

12. The plasma processing apparatus of claim 11, wherein the slant surface includes a cone surface, a spherical surface, a parabolic surface, or a combination thereof.