Substrate processing apparatus for drying substrate

• US 7,418,970 B2
• Filed: 12/18/2003
• Issued: 09/02/2008
• Est. Priority Date: 12/25/2002
• Status: Expired due to Fees

• Current Assignee: SCREEN Holdings Co., Ltd.
• Original Assignee: SCREEN Holdings Co., Ltd.
• Inventors: Sugimoto, Hiroaki, Hashizume, Akio, Okuda, Seiichiro
• Primary Examiner(s): Barr; Michael
• Assistant Examiner(s): Riggleman; Jason P
• Application Number:
  US10/740,711
• Publication Number:
  US 20040163683A1
• Time in Patent Office: 1,720 Days
• Field of Search: 134/56.R, 134/105
• US Class Current: 134/105
• CPC Class Codes: H01L 21/67034 for drying
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust outlet of the container exhausts an atmosphere from the container to reduce pressure in the container. Therefore, the substrate processing apparatus is capable of performing (1) the process of drying a substrate in a reduced-pressure atmosphere by the use of the vapor of organic solvent, and (2) the process of drying the substrate in the reduced-pressure atmosphere by heating, to thereby efficiently dry the substrate.

Claims

1. A substrate processing apparatus for drying a substrate after a rinsing solution adhering to a surface of the substrate is spun off by rotating the substrate, said substrate processing apparatus comprising:

a first container for receiving a substrate;

a first holding element provided in said first container for holding said substrate in a gaseous atmosphere;

a heating element provided in said first container for heating said substrate held by said first holding element;

a first process gas discharge element for discharging a process gas into said first container;

a first pressure reduction element for reducing pressure in said first container;

a cleaning unit for discharging a polymer removal solution to remove a polymer deposited on said substrate, followed by supplying a rinsing solution to said substrate to rinse said substrate, and thereafter rotating said substrate to spin off said rinsing solutions; and

a transport element for transporting said substrate between said cleaning unit and said first container, said transport element comprising an arm including a cooling mechanism,

wherein said heating element heats said substrate in said first container in which a reduced-oxygen atmosphere is created by discharging said process gas from said first process gas discharge element, and

said transport element moves said arm to near said first holding element, to thereby cool said substrate heated by said heating element.