Laser patterning of light emitting devices
First Claim
1. A method of shaping a surface of a silicon carbide substrate, comprising:
- patterning a mask layer on the silicon carbide substrate using a laser to remove material from the mask layer, wherein patterning the mask layer comprises applying laser light to the mask layer at an energy sufficient to remove material from the mask layer while scanning a pattern into the mask layer to form three dimensional geometric patterns in the mask layer; and
etching the silicon carbide substrate using the patterned mask layer to define the three dimensional geometric patterns, wherein the three dimensional geometric patterns comprise a plurality of different geometric patterns.
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Accused Products
Abstract
Light extraction features are provided for a light emitting device having a substrate and a semiconductor light emitting element on the substrate by shaping a surface of a layer of semiconductor material utilizing a laser to define three dimensional patterns in the layer of semiconductor material. The layer of semiconductor material may be the substrate. In particular embodiments of the present invention, the surface of the layer of semiconductor material is shaped by applying laser light to the layer of semiconductor material at an energy sufficient to remove material from the layer of semiconductor material. The laser light may also by applied in a blanket manner at a level below the ablation threshold. The application of laser light to the layer of semiconductor material may be followed by etching the substrate. The layer of semiconductor material may be anisotropically etched. A mask could also be patterned utilizing laser light and the layer of semiconductor material etched using the mask. Light emitting devices have three dimensional patterns in a layer of semiconductor material of the device are also provided.
84 Citations
9 Claims
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1. A method of shaping a surface of a silicon carbide substrate, comprising:
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patterning a mask layer on the silicon carbide substrate using a laser to remove material from the mask layer, wherein patterning the mask layer comprises applying laser light to the mask layer at an energy sufficient to remove material from the mask layer while scanning a pattern into the mask layer to form three dimensional geometric patterns in the mask layer; and etching the silicon carbide substrate using the patterned mask layer to define the three dimensional geometric patterns, wherein the three dimensional geometric patterns comprise a plurality of different geometric patterns. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of shaping a surface of a silicon carbide substrate, comprising:
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forming a mask layer on the surface of the silicon carbide substrate; patterning the mask layer using a laser to remove material from the mask layer, wherein patterning the mask layer comprises scanning laser light onto the mask layer at an energy sufficient to remove material from the mask layer to form three-dimensional geometric features in the mask layer having sidewalls that are angled relative to the surface of the substrate; and anisotropically etching the silicon carbide substrate using the patterned mask layer to define the three dimensional geometric patterns having sidewalls that are angled relative to the surface of the substrate.
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Specification