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Dynamic fluid control system for immersion lithography

  • US 7,426,014 B2
  • Filed: 05/18/2005
  • Issued: 09/16/2008
  • Est. Priority Date: 07/01/2004
  • Status: Expired due to Fees
First Claim
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1. An apparatus, comprising:

  • a stage that supports a substrate;

    an optical system that projects an image onto the substrate, the optical system having a last optical element that is spaced from the substrate by a gap at least partly filled with an immersion liquid; and

    a dynamic force control system that maintains a substantially constant force on the last optical element and the stage by locally changing the immersion liquid pressure in the gap to compensate for dynamic changes of the immersion liquid caused by motion of the immersion liquid through the gap and/or movement of the stage.

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