Projection system for a lithographic apparatus
First Claim
1. A projection system for projecting radiation onto a substrate, comprising:
- a plurality of mirror imaging systems each comprising at least a concave mirror and a convex mirror, wherein each mirror imaging system is arranged to direct radiation onto an associated imaging field at the substrate, wherein each concave mirror comprises a separate first mirror portion and a second mirror portion, the first and second mirror portions being independently moveable;
a first flat mirror arranged to direct incident light towards the concave mirror; and
a second flat mirror arranged to reflect light from a patterning device to the first flat mirror;
wherein the first flat mirror and the second flat mirror are arranged so as to receive an image from the patterning device and to reflect the image to the concave mirror so that the orientation of the image at the substrate is the same as the orientation of a corresponding portion of the patterning device producing the image.
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Accused Products
Abstract
A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
28 Citations
13 Claims
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1. A projection system for projecting radiation onto a substrate, comprising:
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a plurality of mirror imaging systems each comprising at least a concave mirror and a convex mirror, wherein each mirror imaging system is arranged to direct radiation onto an associated imaging field at the substrate, wherein each concave mirror comprises a separate first mirror portion and a second mirror portion, the first and second mirror portions being independently moveable; a first flat mirror arranged to direct incident light towards the concave mirror; and a second flat mirror arranged to reflect light from a patterning device to the first flat mirror;
wherein the first flat mirror and the second flat mirror are arranged so as to receive an image from the patterning device and to reflect the image to the concave mirror so that the orientation of the image at the substrate is the same as the orientation of a corresponding portion of the patterning device producing the image. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation; a patterning device that imparts the beam of radiation with a pattern; a substrate table that supports a substrate; a projection system that projects the patterned beam of radiation onto a target portion of the substrate, the projection system comprises a plurality of mirror imaging systems, each mirror imaging system comprising at least a concave mirror and a convex mirror arranged to direct incident radiation onto an associated imaging field at the substrate, wherein each concave mirror comprises a separate first mirror portion and a second mirror portion, the first and second mirror portions being independently moveable; a first flat mirror arranged to direct incident light towards the concave mirror; and a second flat mirror arranged to reflect light from a patterning device to the first flat mirror; wherein the first flat mirror and the second flat mirror are arranged so as to receive an image from the patterning device and to reflect the image to the concave mirror so that the orientation of the image at the substrate is the same as the orientation of a corresponding portion of the patterning device producing the image. - View Dependent Claims (10, 11)
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12. A device manufacturing method, comprising:
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(1) emitting a beam of radiation; (2) imparting the beam of radiation with a pattern; and (3) projecting the patterned beam of radiation onto a substrate, wherein the patterned beam of radiation is projected onto the substrate using a projection system comprises a plurality of mirror imaging systems, each mirror imaging system comprising at least a concave mirror and a convex mirror arranged to direct radiation onto an associated imaging field at the substrate, wherein each concave mirror comprises a separate first mirror portion and a second mirror portion, the first and second mirror portions being independently moveable; a first flat mirror arranged to direct incident light towards the concave mirror; and a second flat mirror arranged to reflect light from a patterning device to the first flat mirror; wherein the first flat mirror and the second flat mirror are arranged so as to receive an image from the patterning device and to reflect the image to the concave mirror in a way that the orientation of the image at the substrate is the same as the orientation of a corresponding portion of the patterning device producing the image. - View Dependent Claims (13)
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Specification