O-ringless tandem throttle valve for a plasma reactor chamber

• US 7,428,915 B2
• Filed: 04/26/2005
• Issued: 09/30/2008
• Est. Priority Date: 04/26/2005
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Ramaswamy, Kartik, Hanawa, Hiroji, Collins, Kenneth S., Nguyen, Andrew, Al-Bayati, Amir, Gallo, Biagio
• Primary Examiner(s): Hepperle; Stephen M
• Application Number:
  US11/115,956
• Publication Number:
  US 20060237136A1
• Time in Patent Office: 1,253 Days
• Field of Search: 137/601.17, 251/117, 251/305
• US Class Current: 137/601.17
• CPC Class Codes: F16K 1/22 with axis of rotation crossing the valve member, e.g. butterfly valves
• CPC Class Codes: F16K 1/223 with a plurality of valve members
• CPC Class Codes: F16K 1/526 for limiting the maximum flow rate, using a second valve
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow
• CPC Class Codes: Y10T 137/87531 Butterfly valve

Abstract

A valve system having high maximum gas flow rate and fine control of gas flow rate, includes a valve housing for blocking gas flow through a gas flow path, a large area opening through said housing having a first arcuate side wall and a small area opening through said housing having a second arcuate side wall, and respective large area and small area rotatable valve flaps in said large area and small area openings, respectively, and having arcuate edges congruent with said first and second arcuate side walls, respectively and defining therebetween respective first and second valve gaps. The first and second valve gaps are sufficiently small to block flow of a gas on one side of said valve housing up to a predetermined pressure limit, thereby obviating any need for O-rings.

Claims

1. A valve assembly for controlling one of gas conductance from a plasma reactor chamber to a vacuum pump or chamber pressure, said valve assembly comprising:

a valve housing having first and second opposing surfaces;

a high conductance valve comprising;

a large area opening in said first and second opposing surfaces and extending through said valve housing, said opening defining a side wall extending between said first and second surfaces having an arcuate cross-section,

a large area rotatable flap in said large area opening having a smooth continuous peripheral edge with an arcuate cross-section generally matching that of said side wall and defining a small gap between said peripheral edge and said side wall in a closed flap position;

a fine control valve comprising;

a small area opening in said first and second opposing surfaces and extending through said valve housing, said opening defining a side wall extending between said first and second surfaces having a smooth continuous arcuate cross-section; and

a small area rotatable flap in said small area opening having a smooth continuous peripheral edge with an arcuate cross-section generally matching that of said side wall and defining a small gap between said peripheral edge and said side wall in a closed flap position;

first plural axial slots in said side wall of said large area opening comprising round holes of truncated circular cross-section extending from one face of said valve housing and having a radial depth that is maximum at said one face and tapers to a minimum depth at a predetermined distance below said one face, said sidewall of said large area opening having a smooth continuous surface between said axial slots.

2. The apparatus of claim 1 further comprising:

a controller coupled to said high conductance valve and to said fine control valves, said controller being programmed to effect large flow changes with said high conductance valve and to make fine adjustments of flow rate with said fine control valve.

3. The apparatus of claim 1 wherein each said small gap is sufficiently small to limit gas conductance through said valve assembly within a predetermined pressure range at a predetermined minimum flow rate, wherein said pressure range extends up to about 200 mT and wherein said minimum gas flow rate is about 10 sccm.

4. The apparatus of claim 1 wherein each said small gap is on the order of about twenty thousandths of an inch.

5. The apparatus of claim 1 wherein each said gap is less than the mean collision path length of a gas up to a pressure of 200 mT.

6. The apparatus of claim 1 further comprising second plural slots in said side wall of said large area opening comprising round holes of truncated circular cross-section extending from an opposite face of said valve housing and having a depth that is maximum at said opposite face and tapers to a minimum depth at a predetermined distance below said opposite face.