Plasma processing equipment
First Claim
1. A plasma processing equipment comprising:
- an evacuatable processing container;
a loading table, installed in the processing container, for loading thereon an object to be processed;
a microwave transmission plate provided in an opening of a ceiling of the processing container;
a flat antenna member for supplying microwaves into the processing container via the microwave transmission plate;
a grounded shield cover body covering an upper side of the flat antenna member; and
a waveguide for supplying the microwaves from a microwave generating source to the flat antenna member,wherein at least a part of the waveguide comprises a coaxial waveguide including a tube-shaped waveguide main body of an outer side and a guide axis that penetrates a central portion of the waveguide main body, andwherein at least one of the waveguide main body and the guide axis includes, along its longitudinal axis, a high dielectric portion formed of a high dielectric material and a conductor portion formed of a conductor material such that the conductor portion and the high dielectric portion have the same diameter, and the high dielectric material has a relative dielectric constant of 100 or greater.
1 Assignment
0 Petitions
Accused Products
Abstract
Plasma processing equipment capable of increasing the heat resistance of a wave guide by using a high dielectric material, comprising a processing container 44 formed to allow vacuuming, a loading table 46 installed in the processing container for placing a processed body W thereon, a microwave transmission plate 72 installed in an opening part at the ceiling of the processing container, a flat antenna member 76 for feeding microwave into the processing container through the microwave transmission plate, a shield cover body 80 earthed so as to cover the upper part of the flat antenna member, and a waveguide 90 for feeding the microwave from a microwave generating source to the flat antenna member, characterized in that the waveguide is formed of a high dielectric waveguide 94 using the high dielectric material, whereby the heat resistance of the waveguide can be increased.
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Citations
19 Claims
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1. A plasma processing equipment comprising:
an evacuatable processing container; a loading table, installed in the processing container, for loading thereon an object to be processed; a microwave transmission plate provided in an opening of a ceiling of the processing container; a flat antenna member for supplying microwaves into the processing container via the microwave transmission plate; a grounded shield cover body covering an upper side of the flat antenna member; and a waveguide for supplying the microwaves from a microwave generating source to the flat antenna member, wherein at least a part of the waveguide comprises a coaxial waveguide including a tube-shaped waveguide main body of an outer side and a guide axis that penetrates a central portion of the waveguide main body, and wherein at least one of the waveguide main body and the guide axis includes, along its longitudinal axis, a high dielectric portion formed of a high dielectric material and a conductor portion formed of a conductor material such that the conductor portion and the high dielectric portion have the same diameter, and the high dielectric material has a relative dielectric constant of 100 or greater. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
Specification