Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
First Claim
1. A method of measuring the height-direction position of a mask surface in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
- placing an exposure area defining member at a height-direction measuring position, the height-direction measuring position being different from an exposure position, the exposure area defining member being placed between the mask and the projection optical system and the exposure area defining member defining a shape of the light incident on the photosensitive substrate at the time of exposure; and
measuring the height-direction position of the mask surface.
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Accused Products
Abstract
A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is arranged between the mask M and the projection optical system and defines an exposure area at the time of exposure.
9 Citations
20 Claims
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1. A method of measuring the height-direction position of a mask surface in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
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placing an exposure area defining member at a height-direction measuring position, the height-direction measuring position being different from an exposure position, the exposure area defining member being placed between the mask and the projection optical system and the exposure area defining member defining a shape of the light incident on the photosensitive substrate at the time of exposure; and measuring the height-direction position of the mask surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of measuring the height-direction position of a mask in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
providing a mask stage height position measurement device to measure the height-direction position of a mask stage which holds the mask and to simultaneously measure the height-direction position of the mask surface. - View Dependent Claims (16)
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17. A method of measuring the height-direction position of a mask surface from a reference plane by a height measurement device in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
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providing an exposure area defining member for defining a shape of the light incident on the photosensitive substrate at the time of exposure, and measuring the height-direction position of the mask surface at a position in which a height measurement device is not obstructed by the exposure area defining member, wherein the height-direction position of the mask surface is measured for an area of the mask surface that is greater than the shape defined by the exposure area defining member.
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18. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
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a projection optical system for projecting the reflection mask pattern, the projection optical system comprising an exposure area defining member for defining a shape of light incident on the photosensitive substrate, a measurement means for measuring the height-direction position of the reflection mask, the measurement means comprising means for measuring the height-direction position of an area of the reflection mask that is greater than the area of the shape of light defined by the exposure area defining member, a measurement means for measuring the height-direction position of the photosensitive substrate, a means for adjusting the height-direction position of the reflection mask based on the measured height-direction position of the reflection mask, and a means for adjusting the height-direction position of the photosensitive substrate based on the measured height-direction position of the photosensitive substrate.
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19. An exposure device for exposing a mask with light emitted from a light source and for transferring a pattern formed on the mask onto a photosensitive substrate, comprising:
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a projection optical system, height-direction position measurement means for measuring the height-direction position of the mask, an exposure area defining member between the mask and the projection optical system for defining a shape of the light incident on the photosensitive substrate at the time of exposure, a movement means for moving the exposure area defining member, and a control means for controlling the movement means so as to fix the exposure area defining member at a first position at the time of exposure and to move the exposure area defining member to a second position at the time of measuring the height-direction position.
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20. A method of exposing a photosensitive substrate with a pattern on a mask, the method comprising:
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placing an exposure area defining member at an exposure position, the exposure position being between the mask and the projection optical system, and the exposure area defining member defining a shape of light incident on the photosensitive substrate at the time of exposure; moving the exposure area defining member from the exposure position to a height-direction measuring position; measuring a height-direction position of the mask at the height-direction measuring position; correcting the height-direction position of the mask based on the measured height-direction position data of the mask; emitting light onto the mask in a corrected height-direction position; and transferring the pattern on the mask to the photosensitive substrate.
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Specification