Exposure apparatus and device manufacturing method
First Claim
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1. An exposure apparatus comprising:
- a projection optical system that includes an optical member that comes into contact with a liquid and an optical group arranged between said optical member and a pattern and that projects an image of said pattern onto a substrate via said liquid,a first holding member that holds said optical member;
a second holding member that holds said optical group; and
a connection mechanism that connects said first holding member and said second holding member and reduces a transmitted vibration from said first holding member toward said second holding member.
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Abstract
An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.
85 Citations
49 Claims
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1. An exposure apparatus comprising:
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a projection optical system that includes an optical member that comes into contact with a liquid and an optical group arranged between said optical member and a pattern and that projects an image of said pattern onto a substrate via said liquid, a first holding member that holds said optical member; a second holding member that holds said optical group; and a connection mechanism that connects said first holding member and said second holding member and reduces a transmitted vibration from said first holding member toward said second holding member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An exposure apparatus, comprising:
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a projection optical system that comprises an optical member coming into contact with a liquid and an optical group disposed between said optical member and a pattern and that projects an image of said pattern onto a substrate via said liquid; a ring-shaped member that is provided so as to surround said optical member and has at least one of either a liquid supply port or a liquid recovery port; a first seal member that is disposed between and contacts said optical member and said ring-shaped member and that blocks penetration of liquid into a gap formed between said optical member and said ring-shaped member; and a substrate stage that holds said substrate and is movable relative to said projection optical system and said ring-shaped member. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a first holding member that holds an optical member, said optical member being in contact with said liquid; a second holding member that holds a plurality of optical members; and a connection mechanism that connects said first holding member with said second holding member and vibrationally separates said first holding member and said second holding member. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49)
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Specification