Semiconductor device including a MOSFET having a band-engineered superlattice with a semiconductor cap layer providing a channel
First Claim
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1. A semiconductor device comprising:
- a substrate; and
at least one MOSFET adjacent said substrate and comprisinga superlattice including a plurality of stacked groups of layers and a semiconductor cap layer on an uppermost group of layers,each group of layers of said superlattice comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions being chemically bound together with the chemical bonds traversing the at least one non-semiconductor monolayer therebetween, the non-semiconductor selected from the group consisting of at least one of oxygen, nitrogen, fluorine, and carbon, andsource, drain and gate regions defining a channel through at least a portion of said semiconductor cap layer.
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Abstract
A semiconductor device may include a substrate and at least one MOSFET adjacent the substrate including a superlattice. The superlattice may include a plurality of stacked groups of layers and a semiconductor cap layer on an uppermost group of layers. Each group of layers of the superlattice may comprise a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The MOSFET may further include source, drain, and gate regions defining a channel through at least a portion of the semiconductor cap layer.
118 Citations
37 Claims
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1. A semiconductor device comprising:
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a substrate; and at least one MOSFET adjacent said substrate and comprising a superlattice including a plurality of stacked groups of layers and a semiconductor cap layer on an uppermost group of layers, each group of layers of said superlattice comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions being chemically bound together with the chemical bonds traversing the at least one non-semiconductor monolayer therebetween, the non-semiconductor selected from the group consisting of at least one of oxygen, nitrogen, fluorine, and carbon, and source, drain and gate regions defining a channel through at least a portion of said semiconductor cap layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A semiconductor device comprising:
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a substrate; and at least one MOSFET adjacent said substrate and comprising a superlattice including a plurality of stacked groups of layers and a semiconductor cap layer on an uppermost group of layers, each group of layers of said superlattice comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions being chemically bound together with the chemical bonds traversing the at least one non-semiconductor monolayer therebetween, the non-semiconductor selected from the group consisting of at least one of oxygen, nitrogen, fluorine, and carbon, said semiconductor cap layer comprising the same semiconductor as each base semiconductor portion, and source, drain and gate regions defining a channel lying entirely within said semiconductor cap layer. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A semiconductor device comprising:
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a substrate; and at least one MOSFET adjacent said substrate and comprising a superlattice including a plurality of stacked groups of layers and a semiconductor cap layer on an uppermost group of layers, each group of layers of said superlattice comprising a plurality of stacked base silicon monolayers defining a base silicon portion and at least one oxygen monolayer constrained within a crystal lattice of adjacent base silicon portions, and at least some semiconductor atoms from opposing base semiconductor portions being chemically bound together with the chemical bonds traversing the at least one oxygen monolayer therebetween, and source, drain and gate regions defining a channel through at least a portion of said semiconductor cap layer. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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Specification