Gel and powder making

• US 7,438,882 B2
• Filed: 04/08/2003
• Issued: 10/21/2008
• Est. Priority Date: 04/10/2002
• Status: Expired due to Fees

• Current Assignee: Dow Corning Ireland Limited
• Original Assignee: Dow Corning Ireland Limited
• Inventors: Chevalier, Pierre, Parbhoo, Bhukandas, Leadley, Stuart, Goodwin, Andrew James
• Primary Examiner(s): Zimmer; Marc S
• Application Number:
  US10/510,538
• Publication Number:
  US 20050226802A1
• Time in Patent Office: 2,023 Days
• Field of Search: None
• US Class Current: 423/337
• CPC Class Codes: C23C 4/123 Spraying molten metal
• CPC Class Codes: C23C 4/134 Plasma spraying

Abstract

A method of forming a gel and/or powder of a metallic oxide, metalloid oxide and/or a mixed oxide or resin thereof from one or more respective organometallic liquid precursor(s) and/or organometalloid liquid precursor(s) by oxidatively treating said liquid in a non-thermal equilibrium plasma discharge and/or an ionised gas stream resulting therefrom and collecting the resulting product. The non-thermal equilibrium plasma is preferably atmospheric plasma glow discharge, continuous low pressure glow discharge plasma, low pressure pulse plasma or direct barrier discharge. The metallic oxides this invention particularly relates to are those in columns 3a and 4a of the periodic table namely, aluminium, gallium, indium, tin and lead and the transition metals. The metalloids may be selected from boron, silicon, germanium, arsenic, antimony and tellurium. Preferred metalloid oxide products made according to the process of the present invention are in particular oxides of silicon including silicone resins and the like, boron, antimony and germanium.

Claims

1. A method of forming a product selected from at least one of a gel and a powder, the method comprising oxidatively treating a liquid precursor in at least one of a non-thermal equilibrium plasma discharge and an ionized gas stream resulting therefrom and collecting the resulting product, wherein the liquid precursor is selected from at least one organometallic liquid precursor, at least one organometalloid liquid precursor, and mixtures thereof and wherein the liquid precursor is introduced into the non-thermal equilibrium plasma in the form of an atomized liquid.

2. A method in accordance with claim 1 wherein the liquid precursor is transported through at least one of an atmospheric plasma discharge and an ionized gas stream resulting therefrom, by being dropped under gravity or entrained in a carrier gas.

3. A method in accordance with claim 1 wherein the atomized liquid is introduced into the non-thermal equilibrium plasma by direct injection.

4. A method in accordance with claim 1 wherein the non-thermal equilibrium plasma is an atmospheric plasma glow discharge.

5. A method in accordance with claim 1 wherein the non-thermal equilibrium plasma is selected from a continuous low pressure glow discharge plasma, a low pressure pulse plasma and a dielectric barrier discharge.

6. A method in accordance with claim 1 wherein the liquid precursor is at least one of an organometallic compound of titanium, zirconium, iron, aluminium, indium and tin.

7. A method in accordance with claim 1 wherein the liquid precursor is an organometalloid compound of germanium or silicon.

8. A method in accordance with claim 7 wherein the silicon organometalloid compound is an organopolysiloxane having a viscosity of from 0.65 mPa·

s. to 1000 mPa·

s.

9. The method according to claim 1 wherein the step of treating is carried out using an apparatus comprising a means for generating a nonthermal equilibrium plasma, a means of at least one of introducing and retaining liquid precursor, wherein the means of introducing the liquid precursor is an atomizer.

10. The method in accordance with claim 9 wherein said apparatus is an atmospheric pressure glow discharge assembly wherein the atmospheric plasma is generated between spaced apart parallel electrodes which are flat, parallel or concentric parallel electrodes.

11. The method in accordance with claim 9 comprising a pair of vertically arrayed, parallel spaced-apart planar electrodes with at least one dielectric plate between the pair of electrodes, adjacent one electrode, the spacing between the dielectric plate and the other dielectric plate or electrode forming a plasma region.

12. The method in accordance with claim 11 wherein each electrode is in the form of a watertight box having a side formed by a dielectric plate having bonded thereto on the interior of the box a planar electrode together with a liquid inlet adapted to spray water or an aqueous solution onto the face of the planar electrode.

13. A method in accordance with claim 7 wherein the silicon organometalloid compound is an organopolysiloxane having a viscosity of from 100 mPa·

s to 1,000,000 mPa·

s. dissolved in at least one of an organic solvent and an organosilicone solvent.