Substrate driven field-effect transistor
First Claim
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1. A substrate driven field effect transistor (FET), comprising:
- a conductive substrate having a source contact covering a substantial portion of a bottom surface thereof;
a first buffer layer above and formed from a similar material to said conductive substrate;
an isolation layer above said first buffer layer;
a second buffer layer above said isolation layer;
a lateral channel above said second buffer layer and formed from a similar material to said conductive substrate;
a drain contact above said lateral channel and formed on a top surface of said substrate driven FET; and
a source interconnect formed through said lateral channel to, without penetrating through, said conductive substrate operable to provide a low resistance coupling between said source contact and said lateral channel.
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Abstract
A substrate driven field effect transistor (FET) and a method of forming the same. In one embodiment, the substrate driven FET includes a substrate having a source contact covering a substantial portion of a bottom surface thereof and a lateral channel above the substrate. The substrate driven FET also includes a drain contact above the lateral channel. The substrate driven FET still further includes a source interconnect that connects the lateral channel to the substrate operable to provide a low resistance coupling between the source contact and the lateral channel.
106 Citations
20 Claims
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1. A substrate driven field effect transistor (FET), comprising:
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a conductive substrate having a source contact covering a substantial portion of a bottom surface thereof; a first buffer layer above and formed from a similar material to said conductive substrate; an isolation layer above said first buffer layer; a second buffer layer above said isolation layer; a lateral channel above said second buffer layer and formed from a similar material to said conductive substrate; a drain contact above said lateral channel and formed on a top surface of said substrate driven FET; and a source interconnect formed through said lateral channel to, without penetrating through, said conductive substrate operable to provide a low resistance coupling between said source contact and said lateral channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of forming a substrate driven field effect transistor (FET) on a conductive substrate, comprising:
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forming a first buffer layer with a similar material to and over said conductive substrate; forming an isolation layer over said first buffer layer; forming a second buffer over said isolation layer; forming a lateral channel with a similar material to said conductive substrate over said second buffer layer; forming a source interconnect through said lateral channel to, without penetrating through, said conductive substrate; forming a drain contact above said lateral channel on a top surface of said substrate driven FET; and forming a source contact over a substantial portion of a bottom surface of said conductive substrate, said source interconnect operable to provide a low resistance coupling between said source contact and said lateral channel. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification