Method of fabricating array substrate having color filter on thin film transistor structure
First Claim
1. A method of forming an array substrate device for use in a liquid crystal display device, comprising:
- forming a gate line on a substrate along a first direction, the gate line including a gate pad at one end thereof;
forming a first insulating layer on the substrate to cover the gate line;
forming a data line over the first insulating layer along a second direction perpendicular to the first direction on the substrate, the data line defining a pixel region with the gate line and including a data pad at one end thereof;
forming a thin film transistor at a crossing region of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode;
forming a black matrix overlapping the thin film transistor, the gate line, and the data line except a first portion of the drain electrode;
forming a second insulating layer over an entire surface of the substrate to cover the black matrix;
patterning the first and second insulating layers to expose the first portion of drain electrode, to form a gate pad contact hole exposing the gate pad, and to form a data pad contact hole exposing the data pad;
forming a first transparent electrode layer over an entire surface of the substrate to cover the patterned second insulating layer and contacting the exposed first portion of the drain electrode;
dropping a liquid-type color resin onto the first transparent electrode layer within the pixel region to form a color filter within the pixel region;
forming a second transparent electrode layer over an entire surface of the substrate to cover the color filter and the first transparent electrode layer; and
patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
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Abstract
A method of forming an array substrate for use in a liquid crystal display device includes forming a gate line, a gate pad, and a gate electrode, forming a first gate insulating layer to cover the gate line, the gate pad, and the gate electrode, forming an active layer and an ohmic contact layer on the first gate insulating layer, forming a data line, a data pad, a source electrode, and a drain electrode, forming a second insulating layer to cover the thin film transistor, forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode, forming a third insulating layer to cover the black matrix, patterning the first, second, and third insulating layers, forming a first transparent electrode layer to cover the patterned third insulating layer, coating an adhesive color film on the first transparent electrode layer, irradiating a laser to portions of the adhesive color film corresponding to the pixel region, removing the adhesive color film to form a color film, repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions, forming a second transparent electrode to cover the color filter and the first transparent electrode layer, and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
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Citations
16 Claims
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1. A method of forming an array substrate device for use in a liquid crystal display device, comprising:
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forming a gate line on a substrate along a first direction, the gate line including a gate pad at one end thereof; forming a first insulating layer on the substrate to cover the gate line; forming a data line over the first insulating layer along a second direction perpendicular to the first direction on the substrate, the data line defining a pixel region with the gate line and including a data pad at one end thereof; forming a thin film transistor at a crossing region of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode; forming a black matrix overlapping the thin film transistor, the gate line, and the data line except a first portion of the drain electrode; forming a second insulating layer over an entire surface of the substrate to cover the black matrix; patterning the first and second insulating layers to expose the first portion of drain electrode, to form a gate pad contact hole exposing the gate pad, and to form a data pad contact hole exposing the data pad; forming a first transparent electrode layer over an entire surface of the substrate to cover the patterned second insulating layer and contacting the exposed first portion of the drain electrode; dropping a liquid-type color resin onto the first transparent electrode layer within the pixel region to form a color filter within the pixel region; forming a second transparent electrode layer over an entire surface of the substrate to cover the color filter and the first transparent electrode layer; and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification
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- Resources
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Current AssigneeLG Philips LCD Company Limited (LG Display Co., Ltd.)
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Original AssigneeLG Display Co., Ltd.
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InventorsPark, Seung-Ryull, Chang, Youn-Gyoung
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Primary Examiner(s)NGO, HUYEN LE
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Application NumberUS11/542,158Publication NumberTime in Patent Office748 DaysField of Search349/43, 349/106, 349/187, 345/88, 345/92, 257/59US Class Current349/43CPC Class CodesG02F 1/133516 Methods for their manufactu...G02F 1/136222 Colour filters incorporated...
