×

Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate

  • US 7,442,629 B2
  • Filed: 08/04/2005
  • Issued: 10/28/2008
  • Est. Priority Date: 09/24/2004
  • Status: Active Grant
First Claim
Patent Images

1. A method of processing a semiconductor substrate, comprisingplacing at least a portion of a surface of the semiconductor substrate in contact with a liquid, andexposing said surface portion to one or more short laser pulses so as to modify surface topography of that portion to generate surface features having heights less than about 1 micrometer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×