Methods and system for improving integrated circuit layout
DC CAFCFirst Claim
1. A method for generating design layout artwork implemented in a computer, comprising:
- receiving a design layout comprising a plurality of layout objects residing on a plurality of layers;
receiving descriptions of manufacturing process;
constructing a system of initial constraints among said layout objects;
computing local process modifications to change said initial constraints using said descriptions of manufacturing process;
constructing new local constraint distances by combining said local process modifications with constraint distances in said system of initial constraints;
enforcing said new local constraint distances; and
updating the coordinate variables of layout objects according to the solutions obtained from enforcing said new local constraint distances;
whereby a new layout is produced that has increased yield and performance.
1 Assignment
Litigations
2 Petitions
Accused Products
Abstract
In accordance with the present method and system for improving integrated circuit layout, a local process modification is calculated from simulated process response variables at a set of control points. Said modification values are incorporated into the layout constraints imposed by design rules and design intent to account for manufacturing friendliness. Solving the updated constraint equation with user specified objective function produces a new layout with increased manufacturability. The new layout may further contain data tags that enable optimal process correction to be performed on selected locations, leading to reduction in data size and mask complexity. Also in accordance with this invention, physical design tools are enhanced to read and process anisotropic design rules.
-
Citations
18 Claims
-
1. A method for generating design layout artwork implemented in a computer, comprising:
-
receiving a design layout comprising a plurality of layout objects residing on a plurality of layers; receiving descriptions of manufacturing process; constructing a system of initial constraints among said layout objects; computing local process modifications to change said initial constraints using said descriptions of manufacturing process; constructing new local constraint distances by combining said local process modifications with constraint distances in said system of initial constraints; enforcing said new local constraint distances; and updating the coordinate variables of layout objects according to the solutions obtained from enforcing said new local constraint distances; whereby a new layout is produced that has increased yield and performance. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
-
15. A system for generating design layout, comprising:
-
means for receiving a design layout comprising a plurality of layout objects residing on a plurality of layers; means for receiving descriptions of manufacturing process; means for constructing a system of initial constraints among said layout objects; means for computing local process modifications to change said initial constraints using said descriptions of manufacturing process; means for constructing new local constraint distances by combining said local process modifications with constraint distances in said system of initial constraints; means for enforcing said new local constraint distances; and means for updating the coordinate variables of layout objects according to the solutions obtained from enforcing said new local constraint distances; such that location specific improvements are incorporated in the layout. - View Dependent Claims (16, 17, 18)
-
Specification