Multiple degree of freedom micro electro-mechanical system positioner and actuator
First Claim
1. A micro electro-mechanical system (MEMS) positioner comprising:
- a first stage extending in a planar direction within a first layer of semiconductor material;
a plurality of first beams extending in the planar direction within said first layer;
a plurality of first flexure hinges disposed within said first layer, coupled to said stage and to said beams;
a plurality of first controlled input thermal actuators extending longitudinally within said first planar layer;
said first actuators being coupled to said first beams at spaced locations thereon;
a second stage extending in a planar direction within a second layer of semiconductor material;
a plurality of second beams extending in the planar direction within said second layer;
a plurality of second flexure hinges disposed within said second layer, coupled to said second stage and to said second beams;
a plurality of second controlled input thermal actuators extending longitudinally within said second planar layer;
said second actuators being coupled to said second beams at spaced locations thereon;
said first layer being superposed with said second layer;
said first layer and said second layer being coupled to one another by an intermediary layer;
said intermediary layer extending intermittently in the planar direction, wherein said first and second layers are coupled to one another at spaced locations thereon;
each of said first and second actuators being selectively actuatable to effect longitudinal expansion thereof;
wherein relative actuation between individual ones of actuators spaced in said planar direction relative to one another is configured to generate controlled movement of said stage within the planar direction;
wherein relative actuation between individual ones of actuators spaced orthogonally to said planar direction relative to one another is configured to generate controlled movement of said stage out of the planar direction;
the relative position between said stage and said support being adjustable in each of six degrees of freedom;
wherein said compliant mechanism forms a quasi-static precision manipulator.
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Accused Products
Abstract
A micro electro-mechanical system (MEMS) positioner, including an actuator and method for making the same, includes a stage formed within a first layer of semiconductor material, along with a series of beams, flexure hinges and controlled input thermal actuators. The actuators are operatively engaged with a second layer, and are selectively actuatable to effect longitudinal expansion thereof, so that relative actuation between individual ones of actuators spaced in the planar direction relative to one another is configured to generate controlled movement of the stage within the planar direction, and relative actuation between individual ones of actuators spaced orthogonally to the planar direction relative to one another is configured to generate controlled movement of the stage out of the planar direction. The relative position between the stage and the support is adjustable in each of six degrees of freedom, so that the compliant mechanism forms a quasi-static precision manipulator.
40 Citations
48 Claims
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1. A micro electro-mechanical system (MEMS) positioner comprising:
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a first stage extending in a planar direction within a first layer of semiconductor material; a plurality of first beams extending in the planar direction within said first layer; a plurality of first flexure hinges disposed within said first layer, coupled to said stage and to said beams; a plurality of first controlled input thermal actuators extending longitudinally within said first planar layer; said first actuators being coupled to said first beams at spaced locations thereon; a second stage extending in a planar direction within a second layer of semiconductor material; a plurality of second beams extending in the planar direction within said second layer; a plurality of second flexure hinges disposed within said second layer, coupled to said second stage and to said second beams; a plurality of second controlled input thermal actuators extending longitudinally within said second planar layer; said second actuators being coupled to said second beams at spaced locations thereon; said first layer being superposed with said second layer; said first layer and said second layer being coupled to one another by an intermediary layer; said intermediary layer extending intermittently in the planar direction, wherein said first and second layers are coupled to one another at spaced locations thereon; each of said first and second actuators being selectively actuatable to effect longitudinal expansion thereof; wherein relative actuation between individual ones of actuators spaced in said planar direction relative to one another is configured to generate controlled movement of said stage within the planar direction; wherein relative actuation between individual ones of actuators spaced orthogonally to said planar direction relative to one another is configured to generate controlled movement of said stage out of the planar direction; the relative position between said stage and said support being adjustable in each of six degrees of freedom; wherein said compliant mechanism forms a quasi-static precision manipulator.
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2. A micro electro-mechanical system (MEMS) positioner comprising:
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a stage extending in a planar direction; at least one beam extending in the planar direction; a plurality of flexure hinges coupled to said stage and to said beams; a plurality of controlled input thermal actuators extending longitudinally within a first planar layer; said actuators being coupled to said at least one beam at spaced locations thereon; a plurality of members extending longitudinally within a second planar layer; said members being coupled to said beam at spaced locations thereon; said first layer being superposed with said second layer; each of said actuators being selectively actuatable to effect longitudinal expansion thereof; wherein actuation of said actuators is configured to generate controlled movement of said stage out of the planar direction; wherein said compliant mechanism forms a quasi-static precision manipulator. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 47)
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30. A micro electro-mechanical system (MEMS) actuator assembly comprising:
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a first actuator extending longitudinally in a first planar layer of semiconductor material; said first actuator forming an electrical pathway therethrough, having a relatively high resistance portion and a relatively low resistance portion; a second actuator extending longitudinally in a second planar layer of semiconductor material; said second actuator forming an electrical pathway therethrough, the pathway having a relatively high resistance portion and a relatively low resistance portion; said first and second layers being superposed with one another; said low resistance portions of said first and second actuators being coupled to one another; said high resistance portions of said first and second actuators being free of one another; each of said first and second actuators being configured for selective actuation by selectively conveying electric current therethrough, to generate thermal expansion of the relatively high resistance portions thereof; wherein common actuation of both said first and second actuators is configured to generate movement of said actuator system within a planar direction; and wherein actuation of one relative to the other of said first and second actuators is configured to generate controlled movement of said system out of the planar direction.
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31. A micro electro-mechanical system (MEMS) actuator assembly comprising:
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a thermal actuator extending longitudinally in a first planar layer; said actuator forming an electrical pathway therethrough; a member extending longitudinally in a second planar layer; said first layer and said second layer being parallel to one another; said actuator and said member being coupled to one another; said actuator being configured for actuation by selective application of electricity thereto, to generate thermal expansion thereof; wherein actuation of said actuator is configured to generate controlled movement of said system out of the planar direction; and wherein said actuator has a relatively high resistance portion having a non-uniform transverse cross-section. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46)
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48. A method of fabricating a positioner, said method comprising:
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(a) providing a semiconductor wafer having at least two device layers alternately superposed with at least two oxide layers; (b) applying a mask layer to the uppermost device layer; (c) etching exposed portions of the uppermost device layer; (d) etching exposed portions of the uppermost oxide layer; (e) removing the mask layer; (f) applying a metallization layer onto exposed portions of the device layers; (g) masking portions of the metallization layer, to mask a desired contact area; (h) etching the metallization layer to remove unwanted portions thereof; (i) removing the mask from remaining metallization to reveal contact areas; (j) masking exposed areas of the wafer; (k) etching exposed portions of the exposed device layer; (l) etching exposed portions of the exposed oxide layer; (m) etching exposed portions of exposed device layer; (n) masking the underside of the wafer and protecting the topside of the wafer; (o) etching the underside of the wafer to an oxide layer; (p) applying a vaporized etchant to the wafer to remove exposed portions of oxide layer; and (q) removing the mask.
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Specification