Calibration substrate and method for calibrating a lithographic apparatus

• US 7,453,063 B2
• Filed: 12/08/2004
• Issued: 11/18/2008
• Est. Priority Date: 12/08/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mertens, Jeroen Johannes Sophia Maria, Ottens, Joost Jeroen, Menchtchikov, Boris, Goorman, Koen, De Jong, Frederick Eduard
• Primary Examiner(s): Wells; Nikita
• Application Number:
  US11/006,819
• Publication Number:
  US 20060119830A1
• Time in Patent Office: 1,441 Days
• Field of Search: 250/306, 250/307, 250/310, 250/492.2, 250/492.3
• US Class Current: 250/306
• CPC Class Codes: G03F 7/70516 Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
• CPC Class Codes: G03F 7/70616 Monitoring the printed patterns
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10⁻⁶ K⁻¹ to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

Claims

1. A calibration substrate for use during calibration of a lithographic apparatus, the calibration substrate comprising:

a first substantially flat surface;

a second substantially flat surface that is substantially parallel to the first surface; and

an edge that connects the first surface to the second surface,

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×

10<sup>−

6</sup> K<sup>−

1</sup> to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

2. A calibration substrate according to claim 1, wherein the thermal expansion coefficient is less than about 0.1×

10<sup>−

6</sup> K<sup>−

1</sup>.

3. A calibration substrate according to claim 2, wherein the thermal expansion coefficient is less than about 0.05×

10<sup>−

6</sup> K¹.

4. A calibration substrate according to claim 1, wherein said thermal changes comprise expansion of the substrate.

5. A calibration substrate according to claim 1, wherein said thermal changes comprise shrinkage of the substrate.

6. A calibration substrate according to claim 1, wherein the material is a glass ceramic material.

7. A calibration substrate according to claim 6, wherein the material is ZERODUR®

glass ceramic material.

8. A calibration substrate according to claim 6, wherein the material is CLEARCERAM®

glass ceramic material.

9. A calibration substrate according to claim 1, wherein the material is a glass material.

10. A calibration substrate according to claim 9, wherein the material is ULE®

glass material.

11. A calibration substrate according to claim 1, wherein the material is cordierite.

12. A calibration substrate according to claim 1, wherein the first surface and the second surface each have a diameter of about 200 mm.

13. A calibration substrate according to claim 12, wherein a thickness of the substrate at a center point of the first surface is about 705 μ

m to about 745 μ

m.

14. A calibration substrate according to claim 1, wherein the first surface and the second surface each have a diameter of about 300 mm.

15. A calibration substrate according to claim 14, wherein a thickness of the substrate at a center point of the first surface is about 755 μ

m to about 795 μ

m.

16. A calibration substrate according to claim 1, wherein the edge comprises a notch.

17. A calibration substrate according to claim 1, wherein the first surface comprises a coating having an optical density of greater than about 5.

18. A calibration substrate according to claim 17, wherein the coating comprises TiN.

19. A calibration substrate according to claim 18, wherein the coating has a thickness of about 200 nm.

20. A calibration substrate according to claim 1, wherein the second surface comprises a coating having a volume resistivity of less than about 1×

10⁹ Ω

/cm.

21. A calibration substrate according to claim 20, wherein the coating comprises TiN.

22. A calibration substrate according to claim 21, wherein the coating has a thickness of about 100 nm.

23. A method for calibrating a lithographic apparatus, the method comprising:

imaging a marker provided on a patterning device onto a radiation-sensitive layer on a calibration substrate with a beam of radiation;

measuring a property of the image of the marker on the calibration substrate;

determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus; and

adjusting at least one of the operating parameters of the apparatus to correct for the error,

wherein the calibration substrate comprises a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, and

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×

10<sup>−

6</sup> K<sup>−

1</sup> to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

24. A method according to claim 23, wherein the thermal expansion coefficient is less than about 0.10×

10<sup>−

6</sup> K<sup>−

1</sup>.

25. A method according to claim 24, wherein the thermal expansion coefficient is less than about 0.05×

10<sup>−

6</sup> K<sup>−

1</sup>.

26. A method according to claim 23, wherein said thermal changes comprise expansion of the substrate.

27. A method according to claim 23, wherein said thermal changes comprise shrinkage of the substrate.

28. A method according to claim 23, wherein the material is a glass ceramic material.

29. A method according to claim 28, wherein material is ZERODUR®

glass ceramic material.

30. A method according to claim 23, wherein the calibration substrate has a diameter of about 300 mm.

31. A method according to claim 23, wherein the calibration substrate has a diameter of about 200 mm.

32. A method according to claim 23 wherein the marker comprises a plurality of marks.

33. A method according to claim 23, wherein said measuring the property comprises measuring a position of the image of the marker.

34. A method according to claim 33, wherein said position comprises an X position and a Y position.

35. A method according to claim 34, wherein said operating parameter comprises the orthogonality of the substrate table.

36. A method according to claim 23, wherein said measuring the property comprises measuring positions of the developed images of the marks.

37. A method according to claim 36, wherein said adjusting at least one operating parameter comprises adjusting focus and dose parameters of the apparatus.

38. A method for manufacturing a device using a lithographic apparatus, the method comprising:

calibrating the lithographic apparatus with a calibration substrate, the calibration substrate comprising a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×

10<sup>−

6</sup> K<sup>−

1</sup> to reduce deformation thereof due to thermal changes in the calibration substrate while in the lithographic apparatus;

patterning a beam of radiation;

projecting a patterned beam of radiation onto a target area of a radiation sensitive material of a production substrate.

39. A device manufactured according to the method of claim 38.

40. A lithographic apparatus in combination with a calibration substrate for use during calibration of the lithographic apparatus, the lithographic apparatus comprising:

an illumination system for conditioning a beam of radiation;

a support structure for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;

a substrate table for holding the calibration substrate; and

a projection system for projecting the patterned beam of radiation onto a target portion of the calibration substrate, and

the calibration substrate comprising a first substantially flat surface;

a second substantially flat surface that is substantially parallel to the first surface; and

an edge that connects the first surface to the second surface,

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×

10<sup>−

6</sup> K<sup>−

1</sup> to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

41. A combination according to claim 40, wherein the material has a thermal expansion coefficient of less than about 0.10×

10<sup>−

6</sup> K<sup>−

1</sup>.

42. A combination according to claim 40, wherein the material is a glass ceramic material.

43. A combination according to claim 42, wherein the material is ZERODUR®

glass ceramic material.

44. A combination according to claim 40, wherein the calibration substrate has a diameter of about 300 mm.

45. A combination according to claim 40, wherein the calibration substrate has a diameter of about 200 mm.