Increasing pulse-to-pulse radiation beam uniformity
First Claim
Patent Images
1. A system, comprising:
- a first oscillator configured to generate a radiation beam;
a beam conditioning device configured to stabilize the radiation beam to produce a conditioned beam; and
a second oscillator configured to amplify the conditioned beam to produce an amplified beam having substantially less divergence than the radiation beam,wherein a divergence of the conditioned beam, as received at the second oscillator, is substantially equivalent to a divergence of the radiation beam, as transmitted from the first oscillator.
1 Assignment
0 Petitions
Accused Products
Abstract
A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.
24 Citations
33 Claims
-
1. A system, comprising:
-
a first oscillator configured to generate a radiation beam; a beam conditioning device configured to stabilize the radiation beam to produce a conditioned beam; and a second oscillator configured to amplify the conditioned beam to produce an amplified beam having substantially less divergence than the radiation beam, wherein a divergence of the conditioned beam, as received at the second oscillator, is substantially equivalent to a divergence of the radiation beam, as transmitted from the first oscillator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A lithography system, comprising:
-
an illumination system configured to generate an illumination beam of radiation, comprising, a first oscillator configured to generate a radiation beam having a first divergence; a beam conditioning device configured to stabilize the radiation beam to produce a conditioned beam having a second divergence substantially equivalent to the first divergence; and a second oscillator configured to amplify the conditioned beam to produce an illumination beam of radiation having a third divergence, the third divergence being substantially smaller than the first divergence and the second divergence; a patterning device that patterns the illumination beam of radiation; and a projection system that projects the patterned beam onto a target portion of a substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16)
-
-
17. A method, comprising:
-
(a) generating a radiation beam using a first oscillator; (b) maintaining a divergence of the radiation beam to produce a conditioned beam having a divergence substantially equivalent the divergence of the radiation beam; and (c) amplifying the conditioned beam using a second oscillator such that an amplified beam has substantially less divergence than the radiation beam. - View Dependent Claims (18, 19, 20, 21, 22)
-
-
23. A laser, comprising:
-
a first oscillator configured to generate a radiation beam; a beam conditioning device configured to stabilize the radiation beam to produce a conditioned beam; and a second oscillator configured to amplify the conditioned beam to produce an amplified beam having substantially less divergence than the radiation beam, wherein a divergence of the conditioned beam, as received at the second oscillator, is substantially equivalent to a divergence of the conditioned beam, as transmitted from the first oscillator. - View Dependent Claims (24, 25, 26)
-
-
27. An illuminator, comprising:
-
a first oscillator configured to generate a radiation beam having a first divergence; a beam conditioning device configured to stabilize the radiation beam to produce a conditioned beam having a second divergence substantially equivalent to the first divergence; a second oscillator configured to amplify the conditioned beam to produce an amplified beam having a third divergence, the third divergence being substantially smaller than the first divergence and the second divergence; and an optical system configured to process the amplified beam to produce a processed beam. - View Dependent Claims (28, 29, 30, 31, 32, 33)
-
Specification