Apparatus for atomic layer deposition

• US 7,456,429 B2
• Filed: 03/29/2006
• Issued: 11/25/2008
• Est. Priority Date: 03/29/2006
• Status: Active Grant

• Current Assignee: Eastman Kodak Company
• Original Assignee: Eastman Kodak Company
• Inventors: Levy, David H.
• Primary Examiner(s): Lee; Calvin
• Application Number:
  US11/392,006
• Publication Number:
  US 20070228470A1
• Time in Patent Office: 972 Days
• Field of Search: 438149-153, 438/384, 438/680, 257 66- 71, 118/715, 118/728
• US Class Current: 257/66
• CPC Class Codes: C23C 16/45525 Atomic layer deposition [ALD]
• CPC Class Codes: C23C 16/45551 for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
• CPC Class Codes: C23C 16/45563 Gas nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/45595 Atmospheric CVD gas inlets with no enclosed reaction chamber
• CPC Class Codes: C23C 16/545 for coating elongated substrates
• CPC Class Codes: H01L 29/76 Unipolar devices , e.g. field effect transistors

Abstract

The present invention provides a distribution manifold for thin-film material deposition onto a substrate comprising a plurality of inlet ports for a sequence of gaseous materials, an output face comprising a plurality of open elongated output channels, each channel extending in a length direction substantially in parallel. The distribution manifold can be employed in a deposition system for thin film deposition, further comprising a plurality of sources for a plurality of gaseous materials and a support for positioning a substrate in pre-designed close proximity to the output face of the distribution manifold. During operation of the system, relative movement between the output face and the substrate support is accomplished.

Claims

1. A distribution manifold for thin-film material deposition onto a substrate comprising:

a) a plurality of inlet ports comprising at least a first, a second, and a third inlet port capable of receiving a first, a second, and a third gaseous material, respectively;

b) an output face comprising a plurality of open elongated output channels, each channel extending in a length direction substantially in parallel, the output channels comprising at least a first, a second, and a third output channel wherein the output channels are adjacent to each other along the output face, each output channel comprising an output port,

wherein each output port, which is used to provide a flow of gaseous material to the corresponding output channel, allows gaseous flow communication with one of the first, the second, or the third inlet ports and is capable of substantially directing a flow of the corresponding one of the first, the second, and the third gaseous material along the length direction of the output channel towards an end of the output channel whereby the gaseous material is exhausted from the output channel at a position displaced along the length of output channel from the output port.

2. The distribution manifold of claim 1 further comprising an actuator coupled to the body of the distribution manifold to provide reciprocating motion of the distribution manifold in a direction substantially orthogonal to the length direction of the output channel.

3. The distribution manifold of claim 1 wherein each elongated output channel has elongated sides which are defined by partition walls.

4. The distribution manifold of claim 3 wherein each elongated output channel is defined by two stacked side plates separated by a central plate, wherein portions of the side plates extending beyond the central plate, in a height direction perpendicular to the length direction, form the partition walls.

5. The distribution manifold of claim 3 wherein the width of the opening of at least one elongated output channel is between about 0.2 to 5 mm.

6. The distribution manifold of claim 1 wherein at least one output channel further comprises an exhaust port at one end of the output channel capable of drawing in the flow the gaseous material received in the output channel.

7. The distribution manifold of claim 6 wherein the exhaust port allows the gaseous material to be recycled for reuse.

8. The distribution manifold of claim 1 wherein the output face, in cross-section, has curvature.

9. The distribution manifold of claim 1 wherein, in cross-section, the output channels are rectangular.

10. The distribution manifold of claim 1 wherein the output port in each output channel is disposed in proximity to one end of the output channel.

11. The distribution manifold of claim 1 wherein the output port in each output channel is disposed approximately in the center of the output channel.

12. The distribution manifold of claim 1 wherein the plane of the opening of the output port in each output channel is inclined at an angle oblique to the length direction.

13. The distribution manifold of claim 1 wherein the output port in at least one output channel is under a baffle that directs the gaseous flow in the length direction.

14. The distribution manifold of claim 1 wherein there are no elongated channels, adjacent the elongated outlet channels, that are attached to a vacuum source.

15. The distribution manifold of claim 1 wherein at least one of the output channels are open at an elongated end thereof to allow the gaseous material received by the output channel to flow past the side of the distribution manifold or to be collected by a collection manifold.

16. A deposition system for thin film deposition of a solid material onto a substrate comprising:

a) a plurality of sources for, respectively, a plurality of gaseous materials comprising at least a first, a second, and a third source for a first, a second, and a third gaseous material, respectively;

b) a distribution manifold comprising;

(i) a plurality of inlet ports comprising at least a first, a second, and a third inlet port for receiving the first, the second, and the third gaseous material, respectively;

(ii) an output face comprising a plurality of open elongated output channels, each channel extending in a length direction substantially in parallel, the output channels comprising at least a first, a second, and a third output channel,

wherein the output channels are adjacent to each other along the output face,

each output channel having an output port,

wherein each output port, which is used to provide a flow of gaseous material to the corresponding output channel, allows gaseous flow communication with one of the first, the second, and the third input ports and is capable of substantially directing a flow of the corresponding one of the first, the second, or the third gaseous material along the length direction of the output channel towards an end of the output channel whereby the gaseous material is exhausted from the output channel at a position displaced along the length of the output channel from the output port; and

c) a substrate support for supporting a substrate in substantially uniform pre-designed close proximity to the output face of the distribution manifold,

wherein the system is capable, during operation, of providing relative movement between the output face and the substrate surface while maintaining the pre-designed close proximity.

17. The deposition system according to claim 16 further comprising an actuator coupled to the distribution manifold to provide reciprocating motion of the distribution manifold in a direction substantially orthogonal to the length direction of the output channel, thereby providing the distribution manifold with an oscillating motion.

18. The deposition system according to claim 16 further comprising an actuator coupled to the substrate support to provide reciprocating motion of the substrate in a direction substantially orthogonal to the length direction of the output channel of the distribution manifold, thereby providing the substrate with an oscillating motion.

19. The deposition system according to claim 16 wherein the substrate support comprises a transport apparatus for moving the substrate along the output face of the distribution manifold.

20. The deposition system according to claim 19 wherein the movement of the web provided by the transport apparatus is continuous.

21. The deposition system according to claim 16 wherein the total surface area of the substrate for thin film deposition of the solid material exceeds the surface area of the output face of the distribution manifold.

22. The deposition system according to claim 16 wherein the substrate support conveys a moving web.

23. The deposition system according to claim 22 wherein the movement of the moving web provided by the transport apparatus is reciprocating.

24. The deposition system according to claim 16 wherein the substrate support maintains the substrate surface at a separation distance of within 0.4 mm of the output face of the distribution manifold.

25. The deposition system according to claim 16 wherein the flow of gaseous material in the first, the second, and the third output channel is substantially continuous during thin film deposition.

26. The deposition system according to claim 16 further comprising a chamber housing for the distribution manifold and substrate during thin film deposition.

27. The deposition system according to claim 16 wherein the substrate and the distribution manifold are open to the atmosphere.

28. The deposition system of claim 16 wherein each elongated output channel has elongated sides which are defined by partition walls.

29. The deposition system of claim 16 wherein each elongated output channel is defined by two stacked side plates separated by a central plate, wherein portions of the side plates extending beyond the central plate, in a height direction perpendicular to the length direction, form the partition walls.

30. A deposition apparatus for thin film deposition onto a substrate comprising:

a) a plurality of sources for a plurality of gaseous materials, comprising at least a first, a second, and a third source for a first, a second, and a third gaseous material, respectively;

b) a distribution manifold comprising;

(i) a plurality of inlet ports comprising at least a first, a second, and a third inlet port for receiving the first, the second, and the third gaseous material, respectively;

(ii) an output face comprising a plurality of open elongated output channels, each channel extending in a length direction substantially in parallel, the output channels comprising at least a first, a second and a third output channel wherein the output channels are adjacent to each other along the output face,

each output channel having an output port,

wherein each output port, which is used to provide a flow of gaseous material to the corresponding output channel, allows gaseous flow communication with one of the first, the second, and the third input port and is capable of substantially directing flow of the corresponding one of the first, the second, and the third gaseous materials along the length direction of the output channel towards an end of the output channel whereby the gaseous material is exhausted from the output channel at a position displaced along the length of the output channel from the output port; and

c) a conveyer for moving a web substrate past the output face of the distribution manifold to effect thin film deposition over an area of the web substrate, wherein the web substrate is in substantially uniform pre-designed close proximity to the output face of the distribution manifold, and wherein, the system is capable, during operation of the system, of providing relative movement between the output face and substrate surface while maintaining the pre-designed close proximity.

31. The deposition apparatus of claim 30 further comprising a transport assembly for moving the distribution manifold in a direction transverse to web movement.

32. The deposition apparatus of claim 30 further comprising a web motion apparatus that reciprocates web motion between two opposite directions.

33. The deposition apparatus of claim 30 wherein the deposition apparatus is in unsealed relationship to ambient atmosphere.