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Lithographic apparatus and device manufacturing method

  • US 7,460,208 B2
  • Filed: 02/18/2005
  • Issued: 12/02/2008
  • Est. Priority Date: 02/18/2005
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a support frame having a mounting point;

    first and second rows each including arrays of individually controllable elements configured to be used to modulate respective corresponding portions of a beam of radiation; and

    a position sensor configured to measure a position of a first one of the arrays of individually controllable elements relative to at least a second one of the arrays of individually controllable elements of at least the first row within the apparatus.

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