Method for fabricating microelectromechanical optical display devices

• US 7,463,406 B2
• Filed: 02/27/2008
• Issued: 12/09/2008
• Est. Priority Date: 12/31/2004
• Status: Active Grant

• Current Assignee: AU Optronics Corporation, Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: AU Optronics Corporation
• Inventors: Wong, Jia-Fam, Lin, Han-Tu, Lee, Chia-Sheng
• Primary Examiner(s): Lester; Evelyn A.
• Application Number:
  US12/038,221
• Publication Number:
  US 20080158650A1
• Time in Patent Office: 286 Days
• Field of Search: 359/223, 359/224, 359290-292, 359/295, 359/298, 345/85, 345/108
• US Class Current: 359/291
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

A microelectromechanical optical display devices is provided. An optical layer is disposed on a substrate. A plurality of posts are disposed on the optical layer. A reflective layer is disposed on the plurality of posts. A flexible layer is disposed on the reflective layer, wherein edge of the reflective layer is separated from edge of the flexible layer by a distance equal to or smaller than about 2 μm.

Claims

1. An MEMO display device, comprising:

a substrate;

an optical layer disposed on the substrate;

a plurality of posts disposed on the optical layer;

a reflective layer disposed on the plurality of posts; and

a flexible layer disposed on the reflective layer, wherein edge of the reflective layer is separated from edge of the flexible layer by a distance equal to or smaller than about 2 μ

m.

2. The MEMO display device according to claim 1, wherein the substrate is transparent.

3. The MEMO display device according to claim 1, wherein optical layer is transparent and conductive.

4. The MEMO display device according to claim 1, wherein the optical layer includes a first layer and a second layer disposed on the first layer, and the first layer is comprised of indium-tin-oxide (ITO), indium-zinc-oxide (IZO) or the combination thereof.

5. The MEMO display device according to claim 4, wherein the second layer is comprised of aluminum oxide, silicon oxide, silicon nitride, silicon oxynitride or combinations thereof.

6. The MEMO display device according to claim 1, wherein the optical layer includes a first layer and a second layer disposed on the first layer, and the second layer is comprised of aluminum oxide, silicon oxide, silicon nitride, silicon oxynitride or combinations thereof.

7. The MEMO display device according to claim 1, wherein the posts are comprised of polymer.

8. The MEMO display device according to claim 1, wherein the reflective layer is comprised of aluminum or silver and the flexible layer comprises nickel or titanium.

9. The MEMO display device according to claim 1, wherein the reflective layer is comprised of metal.

10. The MEMO display device according to claim 9, wherein the flexible layer is comprised of metal.

11. The MEMO display device according to claim 1, wherein the reflective layer is comprised of aluminum or silver.

12. The MEMO display device according to claim 1, wherein the flexible layer comprises nickel or titanium.

13. The MEMO display device according to claim 1, wherein the reflective layer has a thickness of about 200 Å

to 500 Å

.

14. The MEMO display device according to claim 13, wherein the flexible layer has a thickness of about 800 Å

to 2000 Å

.

15. The MEMO display device according to claim 14, wherein the post has a thickness of about 2000 Å

to 9000 Å

.

16. The MEMO display device according to claim 1, wherein the flexible layer has a thickness of about 800 Å

to 2000 Å

.

17. The MEMO display device according to claim 1, wherein the post has a thickness of about 2000 Å

to 9000 Å

.

18. The MEMO display device according to claim 1, wherein the distance is about 50 Å

to 300 Å

.