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Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

  • US 7,463,413 B2
  • Filed: 01/24/2006
  • Issued: 12/09/2008
  • Est. Priority Date: 04/27/2005
  • Status: Active Grant
First Claim
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1. A multi-layer mirror, comprising a multi-layer stack, the multi-layer stack comprising a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack, the spectral filter top layer comprising a first spectral purity enhancement layer comprising a first material and having a layer thickness d1 and being arranged on the multi-layer stack top layer, wherein the first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF, wherein the first material and the layer thickness d1 are selected to enlarge the ratio of radiation having a wavelength selected from a first wavelength range of 5-20 nm and radiation having a wavelength selected from a second wavelength range of 100-400 nm in a beam of radiation of a source emitting radiation with a wavelength in each wavelength range.

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