Safety mechanism for a lithographic patterning device

• US 7,466,397 B2
• Filed: 07/20/2004
• Issued: 12/16/2008
• Est. Priority Date: 07/22/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Heerens, Gert-Jan, Van De Ven, Bastiaan Lambertus Wilhelmus Marinus
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/894,361
• Publication Number:
  US 20050083499A1
• Time in Patent Office: 1,610 Days
• Field of Search: 355/53, 355 72- 76, 310/10, 310/12, 361/234
• US Class Current: 355/75
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

Claims

1. A mechanism for containing displacement of a patterning device connected to a movable support structure, comprising:

at least one x-directed stopping structure and at least one y-directed stopping structure, said x-directed stopping structure and said y-directed stopping structure configured to contain said patterning device relative to the support structure along the xy plane of said patterning device; and

at least one z-directed stopping structure configured to contain said patterning device relative to said support structure along a direction out of the xy plane of said patterning device,

wherein the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, is moveable to allow movement of said patterning device during an exchange of said patterning device, and

wherein the x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, substantially does not contact the patterning device when the patterning device occupies its nominal position relative to the support structure.

2. The mechanism of claim 1, wherein said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, is operated by a positioning system used during the exchange.

3. The mechanism of claim 1, wherein said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, is operated by a dedicated actuator.

4. The mechanism of claim 1, wherein a distance between said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, and said patterning device when the patterning device occupies its nominal position relative to said support structure is about 1 mm to about 3 mm.

5. The mechanism of claim 1, wherein said x-directed stopping structure and y-directed stopping structure are attached to said support structure.

6. The mechanism of claim 1, comprising at least an integrated xy-directed stopping structure.

7. The mechanism of claim 1, further comprising a connector configured to secure said patterning device relative to the support structure;

and wherein the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, is configured to contain displacement of said patterning device in case of failure of said connector.

8. The mechanism of claim 1, comprising at least three x-directed stopping structures, at least three y-directed stopping structures, and at least three z-directed stopping structures.

9. The mechanism of claim 1, wherein the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, comprises a flexible element and a holding element, the flexible element being attached to the support structure, and the holding element being attached to the flexible element.

10. The mechanism of claim 9, wherein the flexible element is a leaf spring.

11. The mechanism of claim 9, wherein the flexible element is a spring mounted pin.

12. The mechanism of claim 9, comprising three flexible elements, each provided with a holding element.

13. The mechanism of claim 1, further comprising:

a positioning system configured to position said patterning device relative to said support structure,

wherein (i) during a projection phase, said patterning device is secured to said support structure by a connector while a patterned beam is projected onto a target portion of a substrate, (ii) during the exchange, said patterning device is exchanged using the positioning system to position said patterning device relative to said support structure, at least a part of said positioning system being withdrawn after said patterning device has been positioned, and (iii) the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, is configured to contain said patterning device in case of failure of said connector at least during the projection phase.

14. The mechanism of claim 13, wherein, during the exchange, said positioning system performs positioning movements including the withdrawal of at least a part of said positioning system after said patterning device has been positioned,

wherein said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, is configured to contain said patterning device in case of failure of the connector in a safety mode, and

wherein, during the exchange, said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or combination, is activated from an inactive mode based on a positioning movement of said positioning system.

15. The mechanism of claim 13, wherein said positioning system comprises a reticle carrier configured to operate said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof.

16. The mechanism of claim 13, wherein a part of said positioning system configured to operate said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, comprises an interface configured to engage said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof.

17. A method for containing displacement of a patterning device connected to a movable support structure, comprising:

containing said patterning device relative to the support structure along an xy plane of said patterning device using a x-directed stopping structure and a y-directed stopping structure;

containing said patterning device relative to said support structure along a direction out of the xy plane of said patterning device using a z-directed stopping structure; and

moving the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, to allow movement of said patterning device during an exchange of said patterning device,

wherein the x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, substantially does not contact the patterning device when the patterning device occupies its nominal position relative to the support structure.

18. The method of claim 17, comprising operating said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, using a positioning system used during the exchange.

19. The method of claim 17, comprising operating said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, by a dedicated actuator.

20. The method of claim 17, wherein a distance between said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, and said patterning device when the patterning device occupies its nominal position relative to said support structure is about 1 mm to about 3 mm.

21. The method of claim 17, wherein said x-directed stopping structure and y-directed stopping structure are attached to said support structure.

22. The method of claim 17, comprising containing said patterning device using an integrated xy-directed stopping structure.

23. The method of claim 17, further comprising securing said patterning device relative to the support structure using a connector and comprising containing displacement of said patterning device in case of failure of said connector using the x-directed stopping structure, the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof.

24. The method of claim 17, comprising containing said patterning device using at least three x-directed stopping structures, at least three y-directed stopping structures, and at least three z-directed stopping structures.

25. The method of claim 17, wherein the x-directed stopping structure, or the y-directed stopping structure, or the z-directed stopping structure, or any combination thereof, comprises a flexible element and a holding element, the flexible element being attached to the support structure, and the holding element being attached to the flexible element.

26. The method of claim 25, wherein the flexible element comprises a leaf spring.

27. The method of claim 25, wherein the flexible element comprises a spring mounted pin.

28. The method of claim 25, comprising three flexible elements, each provided with a holding element.

29. The method of claim 17, further comprising:

positioning said patterning device relative to said support structure using a positioning system;

securing said patterning device to the support structure using a connector, during a projection phase, while a patterned beam is projected onto a target portion of a substrate;

exchanging said patterning device during the exchange using a positioning system that positions said patterning device relative to the support structure, at least a part of said positioning system being withdrawn after said patterning device has been positioned; and

containing said patterning device in case of failure of said connector at least during the projection phase.

30. The method of claim 29, further comprising:

performing, during the exchange, positioning movements by said positioning system, including the withdrawal of at least a part of said positioning system after said patterning device has been positioned;

containing said patterning device in case of failure of the connector in a safety mode; and

activating, during the exchange, said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, from an inactive mode based on a positioning movement of said positioning system.

31. The method of claim 29, wherein said positioning system comprises a reticle carrier configured to operate said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof.

32. The method of claim 29, wherein a part of said positioning system that operates said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or combination, comprises an interface configured to engage said moveable x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof.

33. A mechanism for containing displacement of a patterning device connected to a movable support structure, comprising:

a x-directed stopping structure and a y-directed stopping structure, said x-directed stopping structure and said y-directed stopping structure configured to contain said patterning device relative to the support structure along the xy plane of said patterning device; and

a z-directed stopping structure configured to contain said patterning device relative to said support structure along a direction out of the xy plane of said patterning device; and

a connector configured to secure said patterning device relative to the support structure,

wherein the z-directed stopping structure is moveable to allow movement of said patterning device during an exchange of said patterning device and configured to contain displacement of said patterning device in case of failure of said connector,

wherein the x-directed stopping structure, or y-directed stopping structure, or z-directed stopping structure, or any combination thereof, substantially does not contact the patterning device when the patterning device occupies its nominal position relative to the support structure.