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Method for forming a photoresist pattern

  • US 7,467,632 B2
  • Filed: 01/04/2007
  • Issued: 12/23/2008
  • Est. Priority Date: 01/05/2004
  • Status: Expired due to Fees
First Claim
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1. A method for forming a photoresist pattern comprising:

  • (a) coating a photoresist composition on top of an underlying layer formed on a semiconductor substrate to form a photoresist film;

    (b) exposing the photoresist film with an exposure light;

    (c) developing the exposed photoresist film with a developing solution, and,(d) spraying a cleaning solution over the photoresist film before or after the exposing step (b),said cleaning solution comprising H2O and an ionic surfactant represented by Formula 1;

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