Brush for cleaning wafer
First Claim
Patent Images
1. A wafer cleaning brush, comprising:
- a core; and
a plurality of spaced-apart nodules disposed to protrude from the core, each of the nodules having a first portion proximately located relative to the core, the first portion including a plurality of micro-size pores, and a second portion distally located relative to the core, the second portion including a plurality of nano-size pores, and each of the nodules including a protrusion of a first porous polymeric material having the plurality of micro-size pores and a layer of a second porous polymeric material having the plurality of nano-size pores coated over a part of the protrusion to form the second portion, with the first portion being an exposed part of the protrusion not coated by the layer.
1 Assignment
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Accused Products
Abstract
In a formulation of a wafer cleaning brush, forming a polymer solution with a plurality of nano-scale porogens or with a synthetic pore forming agent and curing the polymer solution to form a porous polymeric material.
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Citations
4 Claims
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1. A wafer cleaning brush, comprising:
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a core; and a plurality of spaced-apart nodules disposed to protrude from the core, each of the nodules having a first portion proximately located relative to the core, the first portion including a plurality of micro-size pores, and a second portion distally located relative to the core, the second portion including a plurality of nano-size pores, and each of the nodules including a protrusion of a first porous polymeric material having the plurality of micro-size pores and a layer of a second porous polymeric material having the plurality of nano-size pores coated over a part of the protrusion to form the second portion, with the first portion being an exposed part of the protrusion not coated by the layer. - View Dependent Claims (2, 3, 4)
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Specification