Chamber isolation valve RF grounding

• US 7,469,715 B2
• Filed: 07/01/2005
• Issued: 12/30/2008
• Est. Priority Date: 07/01/2005
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Kurita, Shinichi, Beer, Emanuel, Lee, Ke Ling
• Primary Examiner(s): Bastianelli; John
• Application Number:
  US11/174,229
• Publication Number:
  US 20070000608A1
• Time in Patent Office: 1,278 Days
• Field of Search: 251/193, 251/195, 251/196, 277/919, 277/920, 137/554
• US Class Current: 137/554
• CPC Class Codes: F16K 3/0227 Packings
• CPC Class Codes: F16K 51/02 specially adapted for high-vacuum installations
• CPC Class Codes: H01J 2237/166 Sealing means
• CPC Class Codes: H01J 37/32844 Treating effluent gases
• CPC Class Codes: H01L 21/67126 Apparatus for sealing, encapsulating, glassing, decapsulating or the like processes H01L23/02, H01L23/28
• CPC Class Codes: Y02C 20/30 of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product
• CPC Class Codes: Y10S 277/919 Seal including electrical feature
• CPC Class Codes: Y10S 277/92 Seal including electromagnetic shielding feature
• CPC Class Codes: Y10T 137/8242 Electrical

Abstract

A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground a chamber isolation valve and/or isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the chamber isolation valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. Other configurations are also provided.

Claims

1. A method of grounding a chamber isolation valve for a plasma processing system during plasma processing of substrates, wherein the chamber isolation valve contains a door and a vacuum seal, comprising:

moving the door to a position adjacent a first opening in a first chamber and an opposing second opening in a second chamber

compressing the vacuum seal between the second opening and the door; and

establishing electrical contact between the door and at least one electrically grounded component of the plasma processing system using at least one electrically conductive member disposed between the door and the second opening.

2. The method of claim 1, wherein the at least one electrically conductive member comprises an electrically conductive elastomeric member.

3. The method of claim 2, wherein the at least one electrically conductive elastomeric member is fixedly attached to and in electrical communication with the door.

4. The method of claim 2, wherein the at least one electrically conductive elastomeric member is in electrical communication with a bracing member in contact with the first opening.

5. The method of claim 2, wherein the at least one electrically conductive elastomeric member is an elastomeric extrusion, wherein the elastomeric extrusion is selected from the group consisting of an O-strip, a D-strip or a P-strip.

6. The method of claim 2, wherein the at least one electrically conductive elastomeric member is mounted along the external periphery of the vacuum seal.

7. The method of claim 2, wherein the at least one electrically conductive elastomeric member is mounted along the periphery of the second opening.

8. The method of claim 1, wherein the chamber isolation valve further comprises a bracing member adapted to move away from the door to close the first opening, the bracing member comprising one or more conductive bumpers in electrical communication with a periphery of the first opening.

9. The method of claim 8, wherein the one or more conductive bumpers comprise an electrically conductive elastomeric member mounted along the lower periphery of the bracing member.

10. The method of claim 2, wherein the chamber isolation valve further comprises a bracing member adapted to move away from the door to contact a periphery of the first opening, the bracing member comprising one or more conductive bumpers.

11. The method of claim 1, wherein establishing electrical contact between the chamber isolation valve and the at least one electrically grounded component of the plasma-processing system by means of an electrically conductive elastomeric member comprises:

moving at least one conductive surface of a bracing member opposing the door into electrical contact with the first opening.

12. The method of claim 11, wherein the at least one conductive surface comprises one or more conductive bumpers.

13. The method of claim 11, wherein the at least one conductive surface comprises a conductive part of the bracing member.

14. The method of claim 13, wherein the conductive part of the bracing member is a conductive bumper.

15. The method of claim 11, wherein a contact portion of the first opening is the at least one electrically grounded component of the plasma processing system.

16. The method of claim 11, wherein a contact portion of the second opening is the at least one electrically grounded component of the plasma processing system.

33. The method of claim 2, wherein the electrically conductive elastomeric member has a volume resistivity after heat aging of no more than about 0.200 ohm-cm.

34. The method of claim 1, wherein the electrically conductive member comprises a metallic material.

35. The method of claim 34, wherein the metallic material comprises a conductive metal filler disposed in an elastomeric material.

17. A method of grounding a chamber isolation valve for a plasma processing system during plasma processing of substrates, wherein the chamber isolation valve contains a door, a bracing member, and a vacuum seal, comprising:

moving the door and the bracing member to a position adjacent a first opening in a first chamber and an opposing second opening in a second chamber;

moving the door and the bracing member away from each other such that the vacuum seal is compressed between the second opening and the door; and

contacting at least one electrically grounded component of the plasma-processing system with at least one electrically conductive elastomeric member, the at least one elastomeric member disposed between the door and the second opening along an external periphery of the vacuum seal.

18. The method of claim 17, wherein the volume resistivity of the at least one elastomeric member after heat aging is no more than about 0.200 ohm-cm.

19. The method of claim 17, wherein the at least one electrically conductive elastomeric member is an elastomeric extrusion, wherein the elastomeric extrusion is selected from the group consisting of an O-strip, a D-strip or a P-strip.

20. The method of claim 17, wherein the at least one elastomeric member is fixedly attached to and mounted along the external periphery of the vacuum seal.

21. The method of claim 17, wherein the bracing member is electrically coupled to and movable relative to the door.

22. The method of claim 21, wherein the bracing member includes one or more conductive bumpers fixedly attached thereto.

23. The method of claim 17, wherein the one or more conductive bumpers comprise a conductive polymer.

24. The method of claim 17, wherein the at least one elastomeric member comprises metallic material.

36. The method of claim 24, wherein the metallic material comprises a conductive metal filler disposed in an elastomeric material.

25. A method of grounding a chamber isolation valve for a plasma processing system during plasma processing of substrates, wherein the chamber isolation valve contains a door, a bracing member, and a vacuum seal comprising:

moving the door and the bracing member to a position adjacent a first opening in a first chamber and an opposing second opening in a second chamber; and

establishing electrical communication between the first opening and the second opening by moving the door and the bracing member away from each other such that the vacuum seal is compressed between the second opening and the door and the bracing member is in electrical communication with the first opening, wherein one or both of the door and bracing member includes at least one electrically conductive member disposed along an external periphery of the respective opening.

26. The method of claim 25, wherein the electrically conductive member comprises an elastomeric member having a volume resistivity after heat aging of no more than about 0.200 ohm-cm.

27. The method of claim 25, wherein the electrically conductive elastomeric member is an elastomeric extrusion, wherein the elastomeric extrusion is selected from the group consisting of an O-strip, a D-strip or a P-strip.

28. The method of claim 25, wherein the electrically conductive member is fixedly attached to the door along an external periphery of the vacuum seal.

29. The method of claim 25, wherein the electrically conductive member is fixedly attached to the bracing member.

30. The method of claim 29, wherein the electrically conductive member comprises one or more conductive bumpers.

31. The method of claim 25, wherein a periphery of the first opening comprises a grounded component of the plasma processing system.

32. The method of claim 25, wherein a periphery of the second opening comprises a grounded component of the plasma processing system.

37. A method, comprising:

moving a door from a first position spaced from a chamber to a second position sealing the chamber; and

electrically coupling the door to the chamber.