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Cleaning method and solution for cleaning a wafer in a single wafer process

  • US 7,469,883 B2
  • Filed: 07/31/2006
  • Issued: 12/30/2008
  • Est. Priority Date: 06/26/2000
  • Status: Expired due to Fees
First Claim
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1. A method of preparing a rinse solution comprising:

  • using a stacked membrane consisting essentially of a solid membrane on top of a porous membrane;

    passing H2O along said porous membrane; and

    passing CO2 gas along said solid membrane; and

    diffusing said CO2 gas through said solid membrane and dissolving said CO2 gas into said H2O.

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