×

Projection optical system, exposure apparatus, and exposure method

  • US 7,471,374 B2
  • Filed: 10/28/2005
  • Issued: 12/30/2008
  • Est. Priority Date: 05/01/2003
  • Status: Expired due to Fees
First Claim
Patent Images

1. A projection optical system for forming a reduced image of a first surface on a second surface, whereinan optical path between the projection optical system and the second surface is filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in an optical path of the projection optical system is 1,every optical member having a power in the projection optical system is a transmitting optical member,a magnification of the projection optical system is not more than ⅛

  • , andthe projection optical system is substantially telecentric on both a first surface side and a second surface side of the projection optical system.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×