Projection optical system, exposure apparatus, and exposure method
First Claim
1. A projection optical system for forming a reduced image of a first surface on a second surface, whereinan optical path between the projection optical system and the second surface is filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in an optical path of the projection optical system is 1,every optical member having a power in the projection optical system is a transmitting optical member,a magnification of the projection optical system is not more than ⅛
- , andthe projection optical system is substantially telecentric on both a first surface side and a second surface side of the projection optical system.
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Accused Products
Abstract
A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the projection optical system and the second surface being filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in the optical path of the projection optical system is 1, and the magnification of the projection optical system being not more than ⅛. In variations, the projection optical system is substantially telecentric on both the first surface side and the second surface side; every optical member having a power in the projection optical system is a transmitting optical member; and a projection exposure in a one shot-area can include a plurality of partial exposures in partial exposure regions.
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Citations
36 Claims
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1. A projection optical system for forming a reduced image of a first surface on a second surface, wherein
an optical path between the projection optical system and the second surface is filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in an optical path of the projection optical system is 1, every optical member having a power in the projection optical system is a transmitting optical member, a magnification of the projection optical system is not more than ⅛ - , and
the projection optical system is substantially telecentric on both a first surface side and a second surface side of the projection optical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. An exposure method of effecting a projection exposure of a reduced image of a pattern formed on a mask, through a projection optical system onto a photosensitive substrate, the exposure method comprising:
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a preparation step of preparing the projection optical system having a magnification of not more than ⅛
;a filling step of filling an optical path between the projection optical system and the photosensitive substrate with a medium having a refractive index larger than 1.1, where a refractive index of an atmosphere in an optical path of the projection optical system is 1; and an exposure step of effecting a projection exposure in one shot-area on the photosensitive substrate, wherein the exposure step comprises the projection exposure in one shot-area including a plurality of partial exposure regions, and wherein the exposure step further comprises a plurality of partial exposure steps each of which is to perform a projection exposure in the partial exposure region. - View Dependent Claims (33, 34, 35, 36)
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Specification