Correction of optical proximity effects by intensity modulation of an illumination arrangement
First Claim
1. A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:
- adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, andilluminating the patterning device pattern with the first and second illumination shapes.
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Abstract
A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.
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Citations
25 Claims
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1. A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:
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adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A lithographic projection apparatus, comprising:
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an illumination system configured to condition a beam of radiation, the illumination system configured to produce a first illumination shape and a second illumination shape, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of the illumination system, and configured to adjust an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant; a support structure configured to hold a patterning structure configured to pattern the beam of radiation according to a desired pattern; and a projection system configured to project the beam of radiation onto a target portion of a substrate. - View Dependent Claims (12, 13, 14, 15)
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16. A method of configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:
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determining an intensity ratio between a first illumination shape and a second illumination shape that substantially reduces an optical proximity effect due to the patterning device pattern, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus; and based on the intensity ratio, adjusting an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant. - View Dependent Claims (17, 18)
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- 19. The method of 16, further comprising using a first optical element and a second optical element to produce respectively the first and second illumination shapes and wherein the adjusting includes adjusting a power of the radiation beam that impinges on the first optical element.
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21. A machine readable medium encoded with machine executable instructions for performing a method of configuring optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:
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determining an intensity ratio between a first illumination shape and a second illumination shape that substantially reduces an optical proximity effect due to the patterning device pattern, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus; and based on the intensity ratio, adjusting an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant. - View Dependent Claims (22, 23, 24, 25)
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Specification