System and method to pattern an object through control of a radiation source
First Claim
1. A system for patterning an object, comprising:
- a radiation source including a plurality of selectively addressable pn-junction elements, the radiation source generating patterned radiation through selective addressing of the plurality of selectively addressable pn-junction elements; and
a projection system that projects the patterned radiation generated by the radiation source onto a target portion of the object.
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Accused Products
Abstract
A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV radiation by deceleration of electrons accelerated into an n-type region of the pn-junction. The radiation source can have a low operating voltage, a high switching speed, and provides great design freedom. High intensity can be provided, e.g., by the use of large or multiple sources. The pn-junction can be doped with impurities to increase emission of radiation at a desired frequency and increase the efficiency of the device. For protection, the pn-junction may be covered by a layer of transparent oxide. By reverse biasing the pn-junction with a potential difference at least 4V, radiation of wavelength 300 nm or less can be obtained. The pn-junction source of the present invention can replace conventional radiation sources and be using in connection with a mask/contrast device, or can be used to replace both the conventional radiation source and the mask/contrast device.
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Citations
12 Claims
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1. A system for patterning an object, comprising:
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a radiation source including a plurality of selectively addressable pn-junction elements, the radiation source generating patterned radiation through selective addressing of the plurality of selectively addressable pn-junction elements; and a projection system that projects the patterned radiation generated by the radiation source onto a target portion of the object. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method used to pattern an object, comprising:
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selectively addressing an array of pn-junction elements to form a patterned beam of radiation; and projecting the patterned beam of radiation onto a target portion of the object. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification