Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus

• US 7,474,384 B2
• Filed: 11/22/2004
• Issued: 01/06/2009
• Est. Priority Date: 11/22/2004
• Status: Expired due to Fees

• Current Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Franken, Dominicus Jacobus Petrus Adrianus, Nelson, Michael L., Roux, Stephen
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/994,201
• Publication Number:
  US 20060110665A1
• Time in Patent Office: 1,506 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 71, 250/548, 356399-401
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

Claims

1. A lithographic apparatus, comprising:

a radiation system that provides a pulsed beam of radiation;

a patterning device that patterns the beam with a pattern to form a patterned radiation beam;

a projection system having a projection element, the projection system projecting the patterned radiation beam onto a target portion of a substrate on a substrate table; and

an actuator that moves the projection element relative to the substrate, based on a position measurement of the projection element made using an interferometer, to shift the patterned radiation beam that is projected onto the substrate during at least one pulse of the radiation system in order to compensate for a positional error between the substrate table and an aerial image of the projection system.

2. The lithographic apparatus of claim 1, further comprising:

an actuator controller that monitors information relating to the positional error between the substrate table and the aerial image of the projection system and provides the information as a positional error signal to the actuator, wherein the actuator moves the projection element in response to the provided information.

3. The lithographic apparatus of claim 2, wherein the actuator controller determines subsequent positional error signal values and transmits the values to the actuator.

4. The lithographic apparatus of claim 3, wherein the actuator controller uses previous values of the positional error signal and a time lag to determine the subsequent positional error values, which are transmitted to the actuator to move the projection element.

5. The lithographic apparatus of claim 1, wherein the actuator comprises one of a piezo-electric device or a lorentz device.

6. The lithographic apparatus of claim 1, further comprising:

a gravity mass coupled to the projection element, wherein acceleration forces generated by the movement of the projection element are absorbed by the gravity mass.

7. The lithographic apparatus of claim 6, wherein the gravity mass forms part of the actuator.

8. The lithographic apparatus of claim 6, wherein the gravity mass comprises a balance mass or a rejection mass.

9. The lithographic apparatus of claim 1, wherein the projection element is a lens element.

10. The lithographic apparatus of claim 9, wherein the lens element performs a rotational movement around a Z-axis.

11. The lithographic apparatus of claim 1, wherein the projection element is a mirror element.

12. The lithographic apparatus of claim 11, wherein the mirror element performs a translation movement along an x-axis.

13. The lithographic apparatus of claim 1, wherein a plurality of projection elements are used and wherein the projection elements comprise lens elements, or mirror elements, or a combination thereof.

14. The lithographic apparatus of claim 1, wherein the patterning device comprises an array of individually controllable elements.

15. The lithographic apparatus of claim 14, wherein the array of individually controllable elements are a spatial light modulator or a programmable mirror array.

16. A device manufacturing method, comprising:

patterning a beam of radiation using a patterning device;

projecting the patterned beam using a projection element of a projection system onto a target portion of a substrate on a substrate table; and

compensating for a positional error of the projection element, the positional error being computed using interferometry, between a substrate table and an aerial image of the projection system through moving of the projection element to shift the patterned beam during at least one pulse of the beam of radiation.

17. The device manufacturing method of claim 16, further comprising:

monitoring information corresponding to the positional error between the substrate table and the projection system; and

correlating said information into movements of the projection element.

18. The device manufacturing method of claim 16, further comprising:

predicting future behavior of the positional error signal;

feeding-forward said future behavior of the positional error signal to an actuator; and

corresponding said future behavior of the positional error signal into a movement of the projection element.

19. The device manufacturing method of claim 16, further comprising:

predicting future behavior of the positional error signal using previous sample values of the positional error signal and a time lag value.

20. The device manufacturing method of claim 16, wherein the positional error between the substrate table and the aerial image of the projection system occurs due to vibrations in the frame system.

21. A projection element arranged in a projection system for use in a lithographic apparatus, said lithographic apparatus comprising:

a radiation system that provides a pulsed beam of radiation; and

a patterning device that patterns the beam with a pattern to form a patterned radiation beam,

wherein the projection element is movably arranged in the projection system to shift the patterned beam projected onto the substrate during at least one pulse of the radiation system, and wherein the projection element is moved according to interferometric measurements made using an interferometer of a position of the projection element.

22. The projection element of claim 21, wherein the projection element is attached to a rejection or balance mass, wherein acceleration forces generated by the movement of the projection element is absorbed into the rejection or balance mass.

23. The projection element of claim 22, wherein the projection element comprises a mirror element or a lens element.

24. The projection element of claim 23, wherein the mirror element is a translation along an x-axis.

25. The projection element of claim 23, wherein the lens element rotates around a Z-axis.