×

Method for microstructuring flat glass substrates

  • US 7,476,623 B2
  • Filed: 10/04/2005
  • Issued: 01/13/2009
  • Est. Priority Date: 10/09/2004
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for microstructuring flat multi-component glass substrates, said method comprising the steps of:

  • a) coating a substrate surface of a flat glass substrate with a metal layer;

    b) subjecting the metal layer to a structuring process to form at least one structured mask layer, said flat glass substrate consisting of a multi-component glass containing at least three oxide ingredients;

    b) mixing a chemical etching gas with at least one noble gas in a mixture ratio of the chemical etching gas to the at least one noble gas of from 2;

    1 to 6;

    1 in order to form an etching gas mixture; and

    c) performing a chemically reactive ion etching process in which the substrate surface coated with the at least one structured mask layer is exposed to the etching gas mixture;

    wherein sputtering etching occurring in the ion etching process is significantly increased by the presence of the at least one noble gas in the etching gas mixture but a major portion of the etching gas mixture consists of the chemical etching gas.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×